Si3N4

Si3N4 has a DFT band gap of 1.43–4.84 eV across 44 reported structures in 11 space groups; its reference structure is hexagonal (P63/m (No. 176)). Cross-validated across 3 computational databases.

At a glance

Key Properties

Cross-validated computational properties for Si3N4, aggregated across 3 databases.

Band Gap

1.43–4.84 eV
Range across DFT structures · ground state: insulator

Energy Above Hull

0.000 eV/atom
Best (lowest) across sources

Stability

Stable
3 DFT sources

Structures

44
3 databases, 11 space groups
Validation

Cross-Source DFT Agreement

How well independent DFT databases agree on the thermodynamics of Si3N4. Tight agreement means computed properties can be trusted without re-running calculations.

Agreement Score

1.00 / 1.00
Trust tier: high

Hull Spread

0.000 eV
EAH spread across sources

Sources Compared

3
jarvis, materials_project, oqmd

Space Group Consensus

All match
Crystallography

Reported Structures

Lowest-energy structures reported for Si3N4, ranked by energy above hull.

Space GroupCrystal SystemBand Gap (eV)E above hull (eV/atom)E/atom (eV)Density (g/cm³)
P63/m (No. 176)hexagonal4.460.0000-1.192—
——4.320.0000-1.215—
P63/m (No. 176)hexagonal4.250.0000-10.2983.20
——4.420.0001-1.214—
——4.420.0001-1.214—
——4.820.0003-1.214—
——4.710.0006-1.214—
P31c (No. 159)trigonal4.660.0035-10.2943.19
P31c (No. 159)trigonal4.840.0039-1.189—
I-43d (No. 220)cubic4.280.0828-1.110—
——4.220.0994-1.115—
I-43d (No. 220)cubic4.030.0995-10.1983.41
Synthesis

Synthesis Routes

Literature-extracted synthesis procedures targeting Si3N4.

Solid State
Procedure available · ceder_solid_state
Intellectual Property

Patent Landscape

15 patents reference Si3N4 or close compositional variants.

PatentTitleAssigneeGranted
7638200Process for making dense mixed metal Si3N4 targets——
8658432Si/Si3N4 system nanosized particles, biosubstance labeling agent employing the nanosized particles, and method——
7622152MoSi2-Si3N4 composite coating and manufacturing method thereof——
6284690Si3N4 ceramic, Si-base composition for production thereof and processes for producing these——
6391811Pest resistant MoSi2-based materials containing in-situ grown &bgr;-Si3N4 whiskers——
6544917Si3N4 ceramic, Si-base composition for its production, and method for its production——
9302944Si3N4 insulator material for corona discharge igniter systems——
6617272Si3N4 sintered body with high thermal conductivity and method for producing the same——
7446066Reverse reaction sintering of Si3N4/SiC composites——
8673795Si3N4 insulator material for corona discharge igniter systems——
Reference

Frequently Asked Questions

Common questions about Si3N4, answered from cross-validated data.

What is the band gap of Si3N4?

Si3N4 has a DFT-computed band gap of 1.43–4.84 eV across 44 reported structures. Standard DFT underestimates band gaps, so the measured gap is typically larger.

More questions
Is Si3N4 a metal, semiconductor, or insulator?
DFT predicts a wide band gap of up to 4.84 eV (an insulator or wide-band-gap material).
Is Si3N4 thermodynamically stable?
Yes — Si3N4 sits on the convex hull (energy above hull 0 eV/atom), i.e. stable.
What is the crystal structure of Si3N4?
The reference structure of Si3N4 is hexagonal symmetry, space group P63/m (No. 176).
How many polymorphs of Si3N4 are known?
44 structures of Si3N4 are reported across 3 databases, spanning 11 distinct space groups.
How is Si3N4 synthesized?
Literature-reported routes for Si3N4 include solid state.
What elements does Si3N4 contain?
Si3N4 contains N and Si (2 elements).
Where does the data for Si3N4 come from?
Si3N4 data is cross-referenced from jarvis, oqmd, materials_project.
Explore

Related Compounds

Other Silicon Anode Materials in the database.

Data sources & attribution
  • jarvis — Data from JARVIS (jarvis.nist.gov), NIST. Cite: Choudhary et al., npj Comp. Mater. 6, 173 (2020). (LicenseRef-US-Gov-PD)
  • oqmd — Data from the OQMD (oqmd.org). Cite: Saal et al., JOM 65, 1501 (2013); Kirklin et al., npj Comp. Mater. 1, 15010 (2015). (CC-BY-4.0)
  • materials_project — Data from the Materials Project (materialsproject.org). Cite: Jain et al., APL Materials 1, 011002 (2013). (CC-BY-4.0)

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