SiH4
Silane · Silicon tetrahydride
Silane is a stable, insulating silicon hydride gas widely used as a precursor for depositing high-purity silicon in semiconductor and battery technology.
About Silane
Silane is a gaseous silicon hydride that serves as a fundamental building block in materials science. As a wide-band-gap insulator, it is highly valued for its role in chemical vapor deposition processes used to create high-purity silicon films and nanostructures.
Its thermodynamic stability ensures its reliability as a precursor in industrial synthesis. Beyond its role in electronics, it is increasingly studied within the context of silicon-based anode materials, where it acts as a critical source for developing high-capacity battery architectures.
Key Properties
Cross-validated computational properties for Silane, aggregated across 3 databases.
Band GapEnergy needed to move an electron from the valence band to the conduction band. Lower or zero values tend to behave more metallic; larger gaps are more insulating or semiconducting.
Energy Above HullThermodynamic distance from the most stable set of competing phases. 0 eV/atom is on the convex hull; small positive values may still be experimentally accessible.
StabilityA plain-language summary of the best reported energy-above-hull result. It reflects whether the lowest-energy structure is on, near, or far from the stability hull.
StructuresCount of reported calculated crystal structures for this formula, including alternate polymorphs, source databases, and observed space groups.
Applications
Where Silane is used.
Patent Landscape
7 patents reference SiH4 or close compositional variants.
| Patent | Title | Assignee | Granted |
|---|---|---|---|
| 4601798 | Continuous preparation of silane, SiH.sub.4 | — | — |
| 5997949 | Synthesis of W-Si-N films by chemical vapor deposition using WF.sub.6, SiH.sub.4 and NH.sub.3 | — | — |
| 6905963 | Fabrication of B-doped silicon film by LPCVD method using BCI3 and SiH4 gases | — | — |
| 6193813 | Utilization of SiH4 soak and purge in deposition processes | — | — |
| 4499063 | Preparation of silane, SiH.sub.4 | — | — |
| 4405591 | Hydrogenation of chlorosilanes to silane, SiH.sub.4, in bath of molten salts | — | — |
| 5817576 | Utilization of SiH.sub.4 soak and purge in deposition processes | — | — |
Frequently Asked Questions
Common questions about Silane, answered from cross-validated data.
What is SiH4?
Silane is a stable, insulating silicon hydride gas widely used as a precursor for depositing high-purity silicon in semiconductor and battery technology.
What is SiH4 used for?
What is the band gap of SiH4?
Is SiH4 a metal, semiconductor, or insulator?
Is SiH4 thermodynamically stable?
How many polymorphs of SiH4 are known?
What elements does SiH4 contain?
Where does the data for SiH4 come from?
How It Compares
Within the silicon anode materials class.
While most members of the silicon-based class, such as FeSi, Mg2Si, and MoSi2, exist as dense, metallic or semi-metallic crystalline solids, silane is distinct due to its gaseous state and insulating electronic character. Unlike the structural stability found in elemental silicon or the complex silicides like BaSi2, silane provides a versatile molecular pathway for depositing silicon onto substrates, making it an essential chemical precursor rather than a structural component in battery electrodes.
Related Compounds
Other Silicon Anode Materials in the database.
Data sources & attribution
- latticegraph — Lattice Graph Materials Intelligence Platform
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