SiGe

SiGe has a DFT band gap of 0.40–0.99 eV across 55 reported structures in 14 space groups; its reference structure is cubic (Fd-3m (No. 227)). Cross-validated across 3 computational databases.

At a glance

Key Properties

Cross-validated computational properties for SiGe, aggregated across 3 databases.

Band Gap

0.40–0.99 eV
Range across DFT structures · ground state: narrow gap

Energy Above Hull

0.023 eV/atom
Best (lowest) across sources

Stability

Near Hull
3 DFT sources

Structures

55
3 databases, 14 space groups
Validation

Cross-Source DFT Agreement

How well independent DFT databases agree on the thermodynamics of SiGe. Tight agreement means computed properties can be trusted without re-running calculations.

Agreement Score

0.97 / 1.00
Trust tier: high

Hull Spread

0.009 eV
EAH spread across sources

Sources Compared

3
jarvis, materials_project, oqmd

Space Group Consensus

All match
Crystallography

Reported Structures

Lowest-energy structures reported for SiGe, ranked by energy above hull.

Space GroupCrystal SystemBand Gap (eV)E above hull (eV/atom)E/atom (eV)Density (g/cm³)
F-43m (No. 216)cubic0.610.0162-11.3073.93
P21 (No. 4)monoclinic0.510.0175-11.3053.81
F-43m (No. 216)cubic0.690.02280.010—
——0.760.02490.025—
P63mc (No. 186)hexagonal0.410.0308-11.2923.93
——0.990.05580.056—
P63mc (No. 186)hexagonal0.400.05780.045—
——0.880.05800.058—
——0.000.34730.347—
——0.000.35210.352—
——0.000.36710.367—
——0.000.44160.442—
Synthesis

Synthesis Routes

Literature-extracted synthesis procedures targeting SiGe.

Solid State
Procedure available · ceder_solid_state
Intellectual Property

Patent Landscape

11 patents reference SiGe or close compositional variants.

PatentTitleAssigneeGranted
10727073Atomic layer etching 3D structures: Si and SiGe and Ge smoothness on horizontal and vertical surfaces——
12252780Growth method of highly twinned SiGe alloy on the basal plane of trigonal substrate under electron beam irradi——
7176111Method for depositing polycrystalline SiGe suitable for micromachining and devices obtained thereof——
8961810SiGe matrix nanocomposite materials with an improved thermoelectric figure of merit——
9018065Horizontal epitaxy furnace for channel SiGe formation——
10125415Structure for relaxed SiGe buffers including method and apparatus for forming——
9484199PECVD microcrystalline silicon germanium (SiGe)——
9752224Structure for relaxed SiGe buffers including method and apparatus for forming——
6995076Relaxed SiGe films by surfactant mediation——
10837115Pre-treatment composition before etching SiGe and method of fabricating semiconductor device using the same——
Reference

Frequently Asked Questions

Common questions about SiGe, answered from cross-validated data.

What is the band gap of SiGe?

SiGe has a DFT-computed band gap of 0.40–0.99 eV across 55 reported structures. Standard DFT underestimates band gaps, so the measured gap is typically larger.

More questions
Is SiGe a metal, semiconductor, or insulator?
DFT predicts a band gap of up to 0.99 eV (a semiconductor). Measured gaps are typically larger.
Is SiGe thermodynamically stable?
SiGe has a lowest energy above hull of 0.023 eV/atom (near hull).
What is the crystal structure of SiGe?
The reference structure of SiGe is cubic symmetry, space group Fd-3m (No. 227).
What is the density of SiGe?
The computed density of the ground-state structure of SiGe is 3.94 g/cm³.
How many polymorphs of SiGe are known?
55 structures of SiGe are reported across 3 databases, spanning 14 distinct space groups.
How is SiGe synthesized?
Literature-reported routes for SiGe include solid state.
What elements does SiGe contain?
SiGe contains Ge and Si (2 elements).
Where does the data for SiGe come from?
SiGe data is cross-referenced from materials_project, jarvis, oqmd, mpaloe, cod.
Explore

Related Compounds

Other Silicon Anode Materials in the database.

Data sources & attribution
  • materials_project — Data from the Materials Project (materialsproject.org). Cite: Jain et al., APL Materials 1, 011002 (2013). (CC-BY-4.0)
  • jarvis — Data from JARVIS (jarvis.nist.gov), NIST. Cite: Choudhary et al., npj Comp. Mater. 6, 173 (2020). (LicenseRef-US-Gov-PD)
  • oqmd — Data from the OQMD (oqmd.org). Cite: Saal et al., JOM 65, 1501 (2013); Kirklin et al., npj Comp. Mater. 1, 15010 (2015). (CC-BY-4.0)
  • mpaloe — Data from MP-ALOE. Cite: Kuner et al., npj Comput. Mater. (2025), doi:10.1038/s41524-025-01834-9.
  • cod — Data from the Crystallography Open Database (crystallography.net/cod/). Cite: Grazulis et al., J. Appl. Cryst. 42, 726 (2009). (CC0-1.0)

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