SiCl2

SiCl2 is a metastable, semiconducting silicon-chlorine compound primarily used as a chemical precursor for the deposition of high-purity silicon materials.

Crystal structure of SiCl2 (monoclinic, C2/c (No. 15))
Ground-state structure · Materials Project
Overview

About SiCl2

SiCl2 is a metastable semiconducting compound composed of silicon and chlorine. As a member of the silicon-based material family, it serves as a specialized precursor and intermediate in chemical vapor deposition processes, playing a critical role in the synthesis of high-purity silicon thin films and advanced semiconductor components.

Its significance lies in its ability to facilitate the transport of silicon atoms in gaseous environments, which is essential for the controlled growth of nanostructures. While its metastable nature requires careful handling, it remains a vital subject of study for optimizing silicon-based anode architectures in next-generation energy storage devices.

At a glance

Key Properties

Cross-validated computational properties for SiCl2, aggregated across 3 databases.

Band Gap

1.14–1.97 eV
Range across DFT structures · ground state: wide gap

Energy Above Hull

0.000 eV/atom
Best (lowest) across sources

Stability

Stable
3 DFT sources

Structures

36
3 databases, 11 space groups
Validation

Cross-Source DFT Agreement

How well independent DFT databases agree on the thermodynamics of SiCl2. Tight agreement means computed properties can be trusted without re-running calculations.

Agreement Score

0.76 / 1.00
Trust tier: medium

Hull Spread

0.061 eV
EAH spread across sources

Sources Compared

3
jarvis, materials_project, oqmd

Space Group Consensus

All match
Crystallography

Reported Structures

Lowest-energy structures reported for SiCl2, ranked by energy above hull.

Space GroupCrystal SystemBand Gap (eV)E above hull (eV/atom)E/atom (eV)Density (g/cm³)
P212121 (No. 19)orthorhombic1.960.0000-0.965—
——1.970.0581-1.219—
P212121 (No. 19)orthorhombic2.020.0610-4.4321.65
——1.140.5778-0.700—
——0.000.6225-0.655—
P6/mmm (No. 191)hexagonal0.001.08010.115—
——0.002.04240.765—
P-1 (No. 2)triclinic———1.70
P1 (No. 1)triclinic———1.72
P1 (No. 1)triclinic———2.04
P1 (No. 1)triclinic———3.82
P-1 (No. 2)triclinic———2.45
Uses

Applications

Where SiCl2 is used.

Chemical vapor depositionSemiconductor manufacturingSilicon thin film growthNanostructure synthesis
Reference

Frequently Asked Questions

Common questions about SiCl2, answered from cross-validated data.

What is SiCl2?

SiCl2 is a metastable, semiconducting silicon-chlorine compound primarily used as a chemical precursor for the deposition of high-purity silicon materials.

More questions
What is SiCl2 used for?
SiCl2 is used in chemical vapor deposition, semiconductor manufacturing, silicon thin film growth, and nanostructure synthesis.
What is the band gap of SiCl2?
SiCl2 has a DFT-computed band gap of 1.14–1.97 eV across 36 reported structures. Standard DFT underestimates band gaps, so the measured gap is typically larger.
Is SiCl2 a metal, semiconductor, or insulator?
DFT predicts a band gap of up to 1.97 eV (a semiconductor). Measured gaps are typically larger.
Is SiCl2 thermodynamically stable?
Yes — SiCl2 sits on the convex hull (energy above hull 0 eV/atom), i.e. stable.
What is the crystal structure of SiCl2?
The reference structure of SiCl2 is monoclinic symmetry, space group C2/c (No. 15).
What is the density of SiCl2?
The computed density of the ground-state structure of SiCl2 is 1.81 g/cm³.
How many polymorphs of SiCl2 are known?
36 structures of SiCl2 are reported across 3 databases, spanning 11 distinct space groups.
What elements does SiCl2 contain?
SiCl2 contains Cl and Si (2 elements).
Where does the data for SiCl2 come from?
SiCl2 data is cross-referenced from jarvis, oqmd, materials_project, mpaloe, cod.
Comparison

How It Compares

Within the silicon anode materials class.

Within the broader class of silicon anode materials, SiCl2 occupies a distinct niche compared to metallic silicides like FeSi or Mg2Si. While those materials are typically investigated for their structural stability and electrochemical capacity in bulk form, SiCl2 is primarily utilized for its gas-phase reactivity, acting as a functional bridge for the deposition of silicon-rich layers that define the performance of modern anode systems.

Explore

Related Compounds

Other Silicon Anode Materials in the database.

Data sources & attribution
  • jarvis — Data from JARVIS (jarvis.nist.gov), NIST. Cite: Choudhary et al., npj Comp. Mater. 6, 173 (2020). (LicenseRef-US-Gov-PD)
  • oqmd — Data from the OQMD (oqmd.org). Cite: Saal et al., JOM 65, 1501 (2013); Kirklin et al., npj Comp. Mater. 1, 15010 (2015). (CC-BY-4.0)
  • materials_project — Data from the Materials Project (materialsproject.org). Cite: Jain et al., APL Materials 1, 011002 (2013). (CC-BY-4.0)
  • mpaloe — Data from MP-ALOE. Cite: Kuner et al., npj Comput. Mater. (2025), doi:10.1038/s41524-025-01834-9.
  • cod — Data from the Crystallography Open Database (crystallography.net/cod/). Cite: Grazulis et al., J. Appl. Cryst. 42, 726 (2009). (CC0-1.0)

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