SiC

SiC has a DFT band gap of 1.18–2.62 eV across 427 reported structures in 41 space groups; its reference structure is trigonal (R3m (No. 160)). Cross-validated across 3 computational databases.

At a glance

Key Properties

Cross-validated computational properties for SiC, aggregated across 3 databases.

Band Gap

1.18–2.62 eV
Range across DFT structures · ground state: wide gap

Energy Above Hull

0.000 eV/atom
Best (lowest) across sources

Stability

Stable
3 DFT sources

Structures

427
3 databases, 41 space groups
Validation

Cross-Source DFT Agreement

How well independent DFT databases agree on the thermodynamics of SiC. Tight agreement means computed properties can be trusted without re-running calculations.

Agreement Score

1.00 / 1.00
Trust tier: high

Hull Spread

0.000 eV
EAH spread across sources

Sources Compared

3
jarvis, materials_project, oqmd

Space Group Consensus

Mixed (most: R3m (No. 160))
Crystallography

Reported Structures

Lowest-energy structures reported for SiC, ranked by energy above hull.

Space GroupCrystal SystemBand Gap (eV)E above hull (eV/atom)E/atom (eV)Density (g/cm³)
R3m (No. 160)trigonal2.230.0000-9.6663.23
——2.150.0000-0.209—
P63mc (No. 186)hexagonal2.060.0000-0.244—
F-43m (No. 216)cubic1.620.0000-0.244—
——2.030.0000-0.209—
P63mc (No. 186)hexagonal2.020.0000-9.6663.23
——1.940.0000-0.209—
——2.030.0000-0.209—
R3m (No. 160)trigonal1.850.0000-9.6663.23
——2.330.0000-0.209—
——2.060.0000-0.209—
P3m1 (No. 156)trigonal1.810.0000-9.6663.23
Intellectual Property

Patent Landscape

303 patents reference SiC or close compositional variants.

PatentTitleAssigneeGranted
4804643Zirconia ceramic article toughened with SiC whiskers——
6133396Highly processable hyperbranched polymer precursors to controlled chemical and phase purity fully dense SiC——
6818557Method of forming SiC capped copper interconnects with reduced hillock formation and improved electromigration——
12064814Method for manufacturing αFe—SiC composite material, and αFe—SiC composite material——
11718532Preparation method of high purity SiC powder——
9552982Apparatuses and methods for depositing SiC/SiCN films via cross-metathesis reactions with organometallic co-re——
8177497Joint between a metal part and a ceramic part based SiC and/or C——
10269554Method for manufacturing SiC epitaxial wafer and SiC epitaxial wafer——
10472714Method to obtain SiC class of films of desired composition and film properties——
11969716Silicon carbide (SiC)-loaded graphene photocatalyst for hydrogen production under visible light irradiation an——
Reference

Frequently Asked Questions

Common questions about SiC, answered from cross-validated data.

What is the band gap of SiC?

SiC has a DFT-computed band gap of 1.18–2.62 eV across 427 reported structures. Standard DFT underestimates band gaps, so the measured gap is typically larger.

More questions
Is SiC a metal, semiconductor, or insulator?
DFT predicts a band gap of up to 2.62 eV (a semiconductor). Measured gaps are typically larger.
Is SiC thermodynamically stable?
Yes — SiC sits on the convex hull (energy above hull 0 eV/atom), i.e. stable.
What is the crystal structure of SiC?
The reference structure of SiC is trigonal symmetry, space group R3m (No. 160).
What is the density of SiC?
The computed density of the ground-state structure of SiC is 3.23 g/cm³.
How many polymorphs of SiC are known?
427 structures of SiC are reported across 3 databases, spanning 41 distinct space groups.
What elements does SiC contain?
SiC contains C and Si (2 elements).
Where does the data for SiC come from?
SiC data is cross-referenced from materials_project, oqmd, jarvis.
Reading

Related Research

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Related Compounds

Other Silicon Anode Materials in the database.

Data sources & attribution
  • materials_project — Data from the Materials Project (materialsproject.org). Cite: Jain et al., APL Materials 1, 011002 (2013). (CC-BY-4.0)
  • oqmd — Data from the OQMD (oqmd.org). Cite: Saal et al., JOM 65, 1501 (2013); Kirklin et al., npj Comp. Mater. 1, 15010 (2015). (CC-BY-4.0)
  • jarvis — Data from JARVIS (jarvis.nist.gov), NIST. Cite: Choudhary et al., npj Comp. Mater. 6, 173 (2020). (LicenseRef-US-Gov-PD)

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