HfSi2
Hafnium disilicide · Hafnium silicide
Hafnium disilicide is a refractory metallic compound known for its high thermal stability and resistance to oxidation. It is primarily utilized in microelectronics and high-temperature structural applications due to its favorable electrical properties and chemical durability.
Key Properties
Cross-validated computational properties for Hafnium disilicide, aggregated across 4 databases.
Band GapEnergy needed to move an electron from the valence band to the conduction band. Lower or zero values tend to behave more metallic; larger gaps are more insulating or semiconducting.
Energy Above HullThermodynamic distance from the most stable set of competing phases. 0 eV/atom is on the convex hull; small positive values may still be experimentally accessible.
StabilityA plain-language summary of the best reported energy-above-hull result. It reflects whether the lowest-energy structure is on, near, or far from the stability hull.
StructuresCount of reported calculated crystal structures for this formula, including alternate polymorphs, source databases, and observed space groups.
Cross-Source DFT Agreement
How well independent DFT databases agree on the thermodynamics of HfSi2. Tight agreement means computed properties can be trusted without re-running calculations.
Agreement ScoreA normalized confidence score summarizing how closely independent DFT databases agree. Higher scores mean tighter cross-source agreement.
Hull SpreadDifference between the highest and lowest energy-above-hull values reported by comparable sources. Smaller spread means less thermodynamic disagreement.
Sources ComparedNumber and names of computational sources with comparable entries for this formula.
Space Group ConsensusWhether independent sources predict the same crystal symmetry for the lowest-energy structure.
Reported Structures
Lowest-energy structures reported for HfSi2, ranked by energy above hull.
| Space GroupSymmetry classification of the crystal arrangement. The number is the international space-group index. | Crystal SystemBroad lattice family, such as cubic, tetragonal, monoclinic, or triclinic, derived from unit-cell symmetry. | Band Gap (eV)Electronic gap calculated for this specific reported structure, measured in electronvolts. | E above hull (eV/atom)Thermodynamic distance from the convex hull for this structure, normalized per atom. Lower is generally more stable. | E/atom (eV)Computed total energy normalized per atom. Use energy above hull, not this value alone, when comparing stability. | Density (g/cm³)Mass per relaxed crystal volume, reported in grams per cubic centimeter. |
|---|---|---|---|---|---|
| Cmcm (No. 63) | orthorhombic | 0.00 | 0.0115 | -21.458 | 8.03 |
| Cm (No. 8) | Monoclinic | — | — | — | 7.99 |
| P-1 (No. 2) | Triclinic | — | — | — | 3.88 |
| C2/m (No. 12) | Monoclinic | — | — | — | 4.34 |
| C2/m (No. 12) | Monoclinic | — | — | — | 7.73 |
| P-1 (No. 2) | Triclinic | — | — | — | 4.02 |
| C2/m (No. 12) | Monoclinic | — | — | — | 10.42 |
| I4/mmm (No. 139) | Tetragonal | — | — | — | 5.41 |
| Cmcm (No. 63) | Orthorhombic | — | — | — | 5.24 |
| C2/m (No. 12) | Monoclinic | — | — | — | 8.08 |
| C2/m (No. 12) | Monoclinic | — | — | — | 6.69 |
| Cm (No. 8) | Monoclinic | — | — | — | 9.28 |
Applications
Where Hafnium disilicide is used.
Frequently Asked Questions
Common questions about Hafnium disilicide, answered from cross-validated data.
What is HfSi2?
Hafnium disilicide is a refractory metallic compound known for its high thermal stability and resistance to oxidation. It is primarily utilized in microelectronics and high-temperature structural applications due to its favorable electrical properties and chemical durability.
What is HfSi2 used for?
What is the band gap of HfSi2?
Is HfSi2 a metal, semiconductor, or insulator?
Is HfSi2 thermodynamically stable?
What is the crystal structure of HfSi2?
What is the density of HfSi2?
How many polymorphs of HfSi2 are known?
What elements does HfSi2 contain?
Where does the data for HfSi2 come from?
Related Compounds
Other Silicon Anode Materials in the database.
Data sources & attribution
- materials_project — Data from the Materials Project. Cite: Jain et al., APL Materials 1, 011002 (2013).
- mpaloe — Data from mpaloe.
- jarvis — Data from JARVIS (NIST). Cite: Choudhary et al., npj Comp. Mater. 6, 173 (2020).
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