Cu4O20Te8

Cu4O20Te8 is a metastable, semiconducting spinel oxide material used in advanced catalytic research.

Crystal structure of Cu4O20Te8 (monoclinic, P21/c (No. 14))
Ground-state structure · Materials Project
Overview

About Cu4O20Te8

Cu4O20Te8 is a complex semiconducting material categorized within the spinel oxide catalyst family. Its unique structural arrangement, characterized by the integration of copper and tellurium within an oxide framework, positions it as a specialized candidate for research into electronic and catalytic phenomena. Although it exists in a metastable state, its structural diversity across multiple databases highlights its significance in materials science exploration. This compound is primarily investigated for its potential to facilitate chemical transformations where electronic conductivity and structural flexibility are critical. By leveraging its semiconducting nature, researchers aim to optimize catalytic pathways that are otherwise inaccessible with traditional, more stable oxide insulators or conductors.

At a glance

Key Properties

Cross-validated computational properties for Cu4O20Te8, aggregated across 4 databases.

Band Gap

0.13 eV
Range across DFT structures

Energy Above Hull

0.028 eV/atom
Best (lowest) across sources

Stability

Metastable
2 DFT sources

Structures

4
4 databases, 2 space groups
Crystallography

Reported Structures

Lowest-energy structures reported for Cu4O20Te8, ranked by energy above hull.

Space GroupCrystal SystemBand Gap (eV)E above hull (eV/atom)E/atom (eV)Density (g/cm³)
P21/c (No. 14)monoclinic0.130.0275-5.7205.48
No. 0unknown1.44
P21/c (No. 14)
4.02
Uses

Applications

Where Cu4O20Te8 is used.

Catalytic researchSemiconductor materials developmentAdvanced chemical synthesis
Reference

Frequently Asked Questions

Common questions about Cu4O20Te8, answered from cross-validated data.

What is Cu4O20Te8?

Cu4O20Te8 is a metastable, semiconducting spinel oxide material used in advanced catalytic research.

More questions
What is Cu4O20Te8 used for?
Cu4O20Te8 is used in catalytic research, semiconductor materials development, and advanced chemical synthesis.
What is the band gap of Cu4O20Te8?
Cu4O20Te8 has a DFT-computed band gap of 0.13 eV across 4 reported structures.
Is Cu4O20Te8 a metal, semiconductor, or insulator?
With a band gap up to 0.13 eV it is a semiconductor.
Is Cu4O20Te8 thermodynamically stable?
Cu4O20Te8 has a lowest energy above hull of 0.028 eV/atom (metastable).
What is the crystal structure of Cu4O20Te8?
The lowest-energy reported polymorph of Cu4O20Te8 is monoclinic symmetry, space group P21/c (No. 14).
What is the density of Cu4O20Te8?
The computed density of the ground-state structure of Cu4O20Te8 is 5.48 g/cm³.
How many polymorphs of Cu4O20Te8 are known?
4 structures of Cu4O20Te8 are reported across 4 databases, spanning 2 distinct space groups.
What elements does Cu4O20Te8 contain?
Cu4O20Te8 contains Cu, O, and Te (3 elements).
Where does the data for Cu4O20Te8 come from?
Cu4O20Te8 data is cross-referenced from materials_project, cod, aflow, omat24.
Comparison

How It Compares

Within the spinel oxide catalysts class.

Unlike the highly stable and widely utilized binary oxides such as CuO, NiO, and ZnO, or the robust ternary spinel MgAl2O4, Cu4O20Te8 occupies a more niche, metastable position. While perovskite-structured oxides like LaNiO3 and LaMnO3 are frequently studied for their magnetic and electronic properties, this tellurium-containing spinel offers a distinct structural motif that differentiates it from the more conventional aluminum-based oxides like Al2O3 and LaAlO3.

Explore

Related Compounds

Other Spinel Oxide Catalysts in the database.

Data sources & attribution
  • materials_project — Data from the Materials Project. Cite: Jain et al., APL Materials 1, 011002 (2013).
  • cod — Data from the Crystallography Open Database. Cite: Grazulis et al., Nucleic Acids Res. 40, D420 (2012).
  • aflow — Data from AFLOW. Cite: Curtarolo et al., Comp. Mater. Sci. 58, 218 (2012).
  • omat24 — Data from OMat24 (Meta FAIR). Cite: Barroso-Luque et al., arXiv 2410.12771 (2024).

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