Ta

Tantalum · Ta

Tantalum is a dense, ductile, and highly corrosion-resistant transition metal used extensively in electronics and chemical processing equipment.

Ta
Crystal structure of Ta (tetragonal, P-421m (No. 113))
Ground-state structure · Materials Project
Overview

About Tantalum

Tantalum is a transition metal characterized by its robust metallic nature and remarkable thermodynamic stability. As a highly reliable material, it remains on the convex hull, indicating its inherent structural integrity under standard conditions.

Its unique physical properties make it indispensable for high-performance engineering. Because it is chemically inert and maintains structural consistency, it is widely utilized in environments where durability and resistance to degradation are paramount.

At a glance

Key Properties

Cross-validated computational properties for Tantalum, aggregated across 6 databases.

Band Gap

Metallic / not reported

Energy Above Hull

0.000 eV/atom
Best (lowest) across sources

Stability

Stable
4 DFT sources

Structures

65
6 databases, 10 space groups
Validation

Cross-Source DFT Agreement

How well independent DFT databases agree on the thermodynamics of Ta. Tight agreement means computed properties can be trusted without re-running calculations.

Agreement Score

1.00 / 1.00
Trust tier: high

Hull Spread

0.000 eV
EAH spread across sources

Sources Compared

3
jarvis, materials_project, oqmd

Space Group Consensus

Mixed (most: P-421m (No. 113))
Crystallography

Reported Structures

Lowest-energy structures reported for Ta, ranked by energy above hull.

Space GroupCrystal SystemBand Gap (eV)E above hull (eV/atom)E/atom (eV)Density (g/cm³)
P42/mnm (No. 136)tetragonal0.000.0000-48.59216.26
Fm-3m (No. 225)cubic0.000.00000.248—
P42/mnm (No. 136)tetragonal0.000.00000.013—
Im-3m (No. 229)cubic0.000.00000.000—
——0.000.00000.000—
Fm-3m (No. 225)cubic0.000.00000.248—
Im-3m (No. 229)cubic0.000.00000.000—
P-421m (No. 113)tetragonal0.000.0000-48.59216.25
——0.000.00010.000—
——0.000.00030.000—
——0.000.00230.002—
——0.000.00260.003—
Uses

Applications

Where Tantalum is used.

CapacitorsChemical processing equipmentSuperalloysMedical implantsHigh-temperature vacuum furnace components
Reference

Frequently Asked Questions

Common questions about Tantalum, answered from cross-validated data.

What is Ta?

Tantalum is a dense, ductile, and highly corrosion-resistant transition metal used extensively in electronics and chemical processing equipment.

More questions
What is Ta used for?
Tantalum (Ta) is used in capacitors, chemical processing equipment, superalloys, medical implants, and high-temperature vacuum furnace components.
What is the band gap of Ta?
The reported DFT structures of Tantalum (Ta) show no band gap. Standard DFT often misses gaps (especially in transition-metal oxides), so this is not proof the real material is a metal.
Is Ta a metal, semiconductor, or insulator?
DFT calculations predict no band gap. Standard DFT can miss gaps, so measurements are needed to confirm metallic behavior.
Is Ta thermodynamically stable?
Yes — Tantalum (Ta) sits on the convex hull (energy above hull 0 eV/atom), i.e. stable.
What is the crystal structure of Ta?
The reference structure of Tantalum (Ta) is tetragonal symmetry, space group P-421m (No. 113).
What is the density of Ta?
The computed density of the ground-state structure of Tantalum (Ta) is 16.25 g/cm³.
How many polymorphs of Ta are known?
65 structures of Ta are reported across 6 databases, spanning 10 distinct space groups.
What elements does Ta contain?
Tantalum (Ta) contains Ta (1 element).
Where does the data for Ta come from?
Ta data is cross-referenced from materials_project, jarvis, oqmd.
Comparison

How It Compares

As a pure elemental metal, Tantalum serves as a foundational reference point for high-performance metallic materials, distinguished by its superior resistance to environmental corrosion compared to more reactive transition metals.

Data sources & attribution
  • materials_project — Data from the Materials Project (materialsproject.org). Cite: Jain et al., APL Materials 1, 011002 (2013). (CC-BY-4.0)
  • jarvis — Data from JARVIS (jarvis.nist.gov), NIST. Cite: Choudhary et al., npj Comp. Mater. 6, 173 (2020). (LicenseRef-US-Gov-PD)
  • oqmd — Data from the OQMD (oqmd.org). Cite: Saal et al., JOM 65, 1501 (2013); Kirklin et al., npj Comp. Mater. 1, 15010 (2015). (CC-BY-4.0)

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