OsO4

Osmium tetroxide · osmic acid

Osmium tetroxide is a stable, insulating inorganic compound widely utilized as a potent oxidizing agent and a vital staining reagent in electron microscopy.

OOs
Crystal structure of OsO4 (monoclinic, C2 (No. 5))
Ground-state structure · Materials Project
Overview

About Osmium tetroxide

Osmium tetroxide is a highly distinctive inorganic oxide characterized by its insulating electronic nature and exceptional thermodynamic stability. It exists as a volatile solid that plays a critical role in specialized chemical processes due to its ability to interact selectively with organic structures.

This compound is widely valued in laboratory settings for its utility in staining biological samples and facilitating specific oxidation reactions. Its position on the convex hull underscores its structural reliability, making it a foundational reagent in advanced analytical and synthetic chemistry.

At a glance

Key Properties

Cross-validated computational properties for Osmium tetroxide, aggregated across 3 databases.

Band Gap

1.56–3.21 eV
Range across DFT structures · ground state: wide gap

Energy Above Hull

0.000 eV/atom
Best (lowest) across sources

Stability

Stable
3 DFT sources

Structures

41
3 databases, 15 space groups
Validation

Cross-Source DFT Agreement

How well independent DFT databases agree on the thermodynamics of OsO4. Tight agreement means computed properties can be trusted without re-running calculations.

Agreement Score

1.00 / 1.00
Trust tier: high

Hull Spread

0.000 eV
EAH spread across sources

Sources Compared

3
jarvis, materials_project, oqmd

Space Group Consensus

Mixed (most: C2 (No. 5))
Crystallography

Reported Structures

Lowest-energy structures reported for OsO4, ranked by energy above hull.

Space GroupCrystal SystemBand Gap (eV)E above hull (eV/atom)E/atom (eV)Density (g/cm³)
I-42m (No. 121)tetragonal3.380.0000-7.7335.17
——3.210.0000-1.265—
C2/c (No. 15)monoclinic3.150.0000-1.008—
C2/c (No. 15)monoclinic3.290.0008-7.7325.39
C2 (No. 5)monoclinic3.250.0015-7.7324.39
I-42m (No. 121)tetragonal3.070.0045-1.003—
——1.560.1596-1.106—
——0.000.6338-0.632—
C2 (No. 5)monoclinic———5.14
P1 (No. 1)triclinic———8.98
C2 (No. 5)monoclinic———7.45
Cm (No. 8)monoclinic———7.33
Uses

Applications

Where Osmium tetroxide is used.

Electron microscopy stainingOrganic synthesisCatalytic dihydroxylationBiological sample preparation
Reference

Frequently Asked Questions

Common questions about Osmium tetroxide, answered from cross-validated data.

What is OsO4?

Osmium tetroxide is a stable, insulating inorganic compound widely utilized as a potent oxidizing agent and a vital staining reagent in electron microscopy.

More questions
What is OsO4 used for?
Osmium tetroxide (OsO4) is used in electron microscopy staining, organic synthesis, catalytic dihydroxylation, and biological sample preparation.
What is the band gap of OsO4?
Osmium tetroxide (OsO4) has a DFT-computed band gap of 1.56–3.21 eV across 41 reported structures. Standard DFT underestimates band gaps, so the measured gap is typically larger.
Is OsO4 a metal, semiconductor, or insulator?
DFT predicts a wide band gap of up to 3.21 eV (an insulator or wide-band-gap material).
Is OsO4 thermodynamically stable?
Yes — Osmium tetroxide (OsO4) sits on the convex hull (energy above hull 0 eV/atom), i.e. stable.
What is the crystal structure of OsO4?
The reference structure of Osmium tetroxide (OsO4) is monoclinic symmetry, space group C2 (No. 5).
What is the density of OsO4?
The computed density of the ground-state structure of Osmium tetroxide (OsO4) is 4.39 g/cm³.
How many polymorphs of OsO4 are known?
41 structures of OsO4 are reported across 3 databases, spanning 15 distinct space groups.
What elements does OsO4 contain?
Osmium tetroxide (OsO4) contains O and Os (2 elements).
Where does the data for OsO4 come from?
OsO4 data is cross-referenced from materials_project, oqmd, jarvis, cod, mpaloe.
Comparison

How It Compares

As a singular, highly specialized oxide, osmium tetroxide stands apart from typical structural ceramics or semiconductors due to its unique volatility and potent reactivity. It serves as a benchmark for heavy-metal oxides used in precision staining and catalytic applications.

Data sources & attribution
  • materials_project — Data from the Materials Project (materialsproject.org). Cite: Jain et al., APL Materials 1, 011002 (2013). (CC-BY-4.0)
  • oqmd — Data from the OQMD (oqmd.org). Cite: Saal et al., JOM 65, 1501 (2013); Kirklin et al., npj Comp. Mater. 1, 15010 (2015). (CC-BY-4.0)
  • jarvis — Data from JARVIS (jarvis.nist.gov), NIST. Cite: Choudhary et al., npj Comp. Mater. 6, 173 (2020). (LicenseRef-US-Gov-PD)
  • cod — Data from the Crystallography Open Database (crystallography.net/cod/). Cite: Grazulis et al., J. Appl. Cryst. 42, 726 (2009). (CC0-1.0)
  • mpaloe — Data from MP-ALOE. Cite: Kuner et al., npj Comput. Mater. (2025), doi:10.1038/s41524-025-01834-9.

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