GeF4

Germanium tetrafluoride · Tetrafluorogermane

Germanium tetrafluoride is a stable, insulating inorganic gas used primarily as a chemical reagent and precursor for material deposition.

FGe
Crystal structure of GeF4 (cubic, I-43m (No. 217))
Ground-state structure · Materials Project
Overview

About Germanium tetrafluoride

Germanium tetrafluoride is a thermodynamically stable inorganic compound characterized by its wide-gap insulating electronic nature. Its chemical structure allows it to serve as a vital precursor in the synthesis of various germanium-containing materials and as a reagent in industrial processes.

Due to its distinct chemical properties, this compound is frequently employed in specialized manufacturing sectors. It is highly valued for its role in chemical vapor deposition and other surface modification techniques where precise control over fluorination is required.

At a glance

Key Properties

Cross-validated computational properties for Germanium tetrafluoride, aggregated across 3 databases.

Band Gap

3.57–5.24 eV
Range across DFT structures · ground state: insulator

Energy Above Hull

0.000 eV/atom
Best (lowest) across sources

Stability

Stable
3 DFT sources

Structures

42
3 databases, 12 space groups
Validation

Cross-Source DFT Agreement

How well independent DFT databases agree on the thermodynamics of GeF4. Tight agreement means computed properties can be trusted without re-running calculations.

Agreement Score

1.00 / 1.00
Trust tier: high

Hull Spread

0.000 eV
EAH spread across sources

Sources Compared

3
jarvis, materials_project, oqmd

Space Group Consensus

All match
Crystallography

Reported Structures

Lowest-energy structures reported for GeF4, ranked by energy above hull.

Space GroupCrystal SystemBand Gap (eV)E above hull (eV/atom)E/atom (eV)Density (g/cm³)
I-43m (No. 217)cubic5.520.0000-5.1443.29
I-43m (No. 217)cubic5.080.0000-2.355—
——5.020.0000-2.579—
——5.240.0147-2.564—
——5.210.0328-2.546—
——4.040.0415-2.537—
——3.570.0663-2.512—
C2/m (No. 12)monoclinic———4.97
C2/m (No. 12)monoclinic———3.73
C2/m (No. 12)monoclinic———3.44
P1 (No. 1)triclinic———4.09
I-43m (No. 217)cubic———2.77
Uses

Applications

Where Germanium tetrafluoride is used.

Chemical vapor depositionFluorinating agentSemiconductor manufacturingSynthesis of organogermanium compounds
Reference

Frequently Asked Questions

Common questions about Germanium tetrafluoride, answered from cross-validated data.

What is GeF4?

Germanium tetrafluoride is a stable, insulating inorganic gas used primarily as a chemical reagent and precursor for material deposition.

More questions
What is GeF4 used for?
Germanium tetrafluoride (GeF4) is used in chemical vapor deposition, fluorinating agent, semiconductor manufacturing, and synthesis of organogermanium compounds.
What is the band gap of GeF4?
Germanium tetrafluoride (GeF4) has a DFT-computed band gap of 3.57–5.24 eV across 42 reported structures. Standard DFT underestimates band gaps, so the measured gap is typically larger.
Is GeF4 a metal, semiconductor, or insulator?
DFT predicts a wide band gap of up to 5.24 eV (an insulator or wide-band-gap material).
Is GeF4 thermodynamically stable?
Yes — Germanium tetrafluoride (GeF4) sits on the convex hull (energy above hull 0 eV/atom), i.e. stable.
What is the crystal structure of GeF4?
The reference structure of Germanium tetrafluoride (GeF4) is cubic symmetry, space group I-43m (No. 217).
What is the density of GeF4?
The computed density of the ground-state structure of Germanium tetrafluoride (GeF4) is 3.29 g/cm³.
How many polymorphs of GeF4 are known?
42 structures of GeF4 are reported across 3 databases, spanning 12 distinct space groups.
What elements does GeF4 contain?
Germanium tetrafluoride (GeF4) contains F and Ge (2 elements).
Where does the data for GeF4 come from?
GeF4 data is cross-referenced from materials_project, jarvis, oqmd, mpaloe.
Comparison

How It Compares

As a distinct inorganic fluoride, this compound represents a key member of the germanium-halide family, functioning as a stable building block for advanced material synthesis and specialized chemical applications.

Data sources & attribution
  • materials_project — Data from the Materials Project (materialsproject.org). Cite: Jain et al., APL Materials 1, 011002 (2013). (CC-BY-4.0)
  • jarvis — Data from JARVIS (jarvis.nist.gov), NIST. Cite: Choudhary et al., npj Comp. Mater. 6, 173 (2020). (LicenseRef-US-Gov-PD)
  • oqmd — Data from the OQMD (oqmd.org). Cite: Saal et al., JOM 65, 1501 (2013); Kirklin et al., npj Comp. Mater. 1, 15010 (2015). (CC-BY-4.0)
  • mpaloe — Data from MP-ALOE. Cite: Kuner et al., npj Comput. Mater. (2025), doi:10.1038/s41524-025-01834-9.

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