ClO3

ClO3 is a thermodynamically stable semiconducting compound composed of chlorine and oxygen atoms.

ClO
Crystal structure of ClO3 (monoclinic, Cc (No. 9))
Ground-state structure · Materials Project
Overview

About ClO3

ClO3 is a distinct inorganic compound composed of chlorine and oxygen. It exhibits semiconducting electronic behavior and maintains a thermodynamically stable state, positioning it as a significant subject for structural analysis within its chemical system.

This material is characterized by a high degree of structural diversity, with numerous reported configurations documented across research databases. Its stability and electronic profile make it an intriguing candidate for investigating fundamental interactions between halogens and oxygen.

At a glance

Key Properties

Cross-validated computational properties for ClO3, aggregated across 4 databases.

Band Gap

1.21–1.41 eV
Range across DFT structures · ground state: narrow gap

Energy Above Hull

0.000 eV/atom
Best (lowest) across sources

Stability

Stable
3 DFT sources

Structures

48
4 databases, 14 space groups
Validation

Cross-Source DFT Agreement

How well independent DFT databases agree on the thermodynamics of ClO3. Tight agreement means computed properties can be trusted without re-running calculations.

Agreement Score

0.07 / 1.00
Trust tier: low

Hull Spread

0.233 eV
EAH spread across sources

Sources Compared

3
jarvis, materials_project, oqmd

Space Group Consensus

All match
Crystallography

Reported Structures

Lowest-energy structures reported for ClO3, ranked by energy above hull.

Space GroupCrystal SystemBand Gap (eV)E above hull (eV/atom)E/atom (eV)Density (g/cm³)
Cc (No. 9)monoclinic1.210.0000-4.5122.43
——1.410.0106-0.185—
Cc (No. 9)monoclinic1.220.23310.224—
Cc (No. 9)monoclinic0.000.4344-4.0781.74
P1 (No. 1)triclinic0.000.51550.507—
——0.001.33941.144—
——0.001.51401.318—
——0.001.86151.666—
——0.002.02191.826—
C2 (No. 5)monoclinic———4.76
P-1 (No. 2)triclinic———4.52
P-1 (No. 2)triclinic———2.96
Reference

Frequently Asked Questions

Common questions about ClO3, answered from cross-validated data.

What is ClO3?

ClO3 is a thermodynamically stable semiconducting compound composed of chlorine and oxygen atoms.

More questions
What is the band gap of ClO3?
ClO3 has a DFT-computed band gap of 1.21–1.41 eV across 48 reported structures. Standard DFT underestimates band gaps, so the measured gap is typically larger.
Is ClO3 a metal, semiconductor, or insulator?
DFT predicts a band gap of up to 1.41 eV (a semiconductor). Measured gaps are typically larger.
Is ClO3 thermodynamically stable?
Yes — ClO3 sits on the convex hull (energy above hull 0 eV/atom), i.e. stable.
What is the crystal structure of ClO3?
The reference structure of ClO3 is monoclinic symmetry, space group Cc (No. 9).
What is the density of ClO3?
The computed density of the ground-state structure of ClO3 is 2.43 g/cm³.
How many polymorphs of ClO3 are known?
48 structures of ClO3 are reported across 4 databases, spanning 14 distinct space groups.
What elements does ClO3 contain?
ClO3 contains Cl and O (2 elements).
Where does the data for ClO3 come from?
ClO3 data is cross-referenced from materials_project, oqmd, jarvis, mpaloe.
Comparison

How It Compares

As a unique entry in its chemical group, ClO3 serves as a foundational reference point for understanding the phase stability and electronic properties of chlorine-oxygen systems. Its position on the convex hull highlights its importance as a stable baseline for future comparative studies of related halogen oxides.

Data sources & attribution
  • materials_project — Data from the Materials Project (materialsproject.org). Cite: Jain et al., APL Materials 1, 011002 (2013). (CC-BY-4.0)
  • oqmd — Data from the OQMD (oqmd.org). Cite: Saal et al., JOM 65, 1501 (2013); Kirklin et al., npj Comp. Mater. 1, 15010 (2015). (CC-BY-4.0)
  • jarvis — Data from JARVIS (jarvis.nist.gov), NIST. Cite: Choudhary et al., npj Comp. Mater. 6, 173 (2020). (LicenseRef-US-Gov-PD)
  • mpaloe — Data from MP-ALOE. Cite: Kuner et al., npj Comput. Mater. (2025), doi:10.1038/s41524-025-01834-9.

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