BCl3

Boron trichloride · Trichloroborane

Boron trichloride is a stable chemical compound used extensively as a precursor in semiconductor manufacturing and industrial chemical synthesis.

BCl
Crystal structure of BCl3 (hexagonal, P63/m (No. 176))
Ground-state structure · Materials Project
Overview

About Boron trichloride

Boron trichloride is a thermodynamically stable compound that serves as a vital reagent in industrial chemistry. Its insulating electronic nature and high reactivity make it an essential building block for synthesizing various boron-containing materials. The compound is widely utilized in the electronics industry, particularly for plasma etching of metals and as a dopant source. Its ability to act as a strong Lewis acid allows it to facilitate complex chemical transformations in both organic and inorganic synthesis.

At a glance

Key Properties

Cross-validated computational properties for Boron trichloride, aggregated across 5 databases.

Band Gap

0.35–4.83 eV
Range across DFT structures · ground state: insulator

Energy Above Hull

0.000 eV/atom
Best (lowest) across sources

Stability

Stable
3 DFT sources

Structures

85
5 databases, 20 space groups
Validation

Cross-Source DFT Agreement

How well independent DFT databases agree on the thermodynamics of BCl3. Tight agreement means computed properties can be trusted without re-running calculations.

Agreement Score

1.00 / 1.00
Trust tier: high

Hull Spread

0.000 eV
EAH spread across sources

Sources Compared

3
jarvis, materials_project, oqmd

Space Group Consensus

—
Crystallography

Reported Structures

Lowest-energy structures reported for BCl3, ranked by energy above hull.

Space GroupCrystal SystemBand Gap (eV)E above hull (eV/atom)E/atom (eV)Density (g/cm³)
——4.750.0000-1.249—
P63/m (No. 176)hexagonal4.720.0000-4.4901.77
P1 (No. 1)triclinic4.430.0000-0.957—
——4.820.0001-1.249—
——4.730.0033-1.246—
P63/m (No. 176)hexagonal4.530.0055-0.952—
——4.720.0076-1.241—
——4.750.0081-1.241—
Cm (No. 8)monoclinic4.130.0194-0.938—
P-62m (No. 189)hexagonal4.190.0320-0.925—
——4.830.0960-1.153—
——4.690.0994-1.150—
Uses

Applications

Where Boron trichloride is used.

Semiconductor etchingChemical vapor depositionOrganic synthesis catalystDopant source
Intellectual Property

Patent Landscape

3 patents reference BCl3 or close compositional variants.

PatentTitleAssigneeGranted
9669378Reduction of SiCl4 in the presence of BCl3——
4070261Production of B.sub.2 H.sub.6 from BCl.sub.3 + H.sub.2 at room temperature by laser induced chemistry——
10010853Reduction of SiCl4 in the presence of BCl3——
Reference

Frequently Asked Questions

Common questions about Boron trichloride, answered from cross-validated data.

What is BCl3?

Boron trichloride is a stable chemical compound used extensively as a precursor in semiconductor manufacturing and industrial chemical synthesis.

More questions
What is BCl3 used for?
Boron trichloride (BCl3) is used in semiconductor etching, chemical vapor deposition, organic synthesis catalyst, and dopant source.
What is the band gap of BCl3?
Boron trichloride (BCl3) has a DFT-computed band gap of 0.35–4.83 eV across 85 reported structures. Standard DFT underestimates band gaps, so the measured gap is typically larger.
Is BCl3 a metal, semiconductor, or insulator?
DFT predicts a wide band gap of up to 4.83 eV (an insulator or wide-band-gap material).
Is BCl3 thermodynamically stable?
Yes — Boron trichloride (BCl3) sits on the convex hull (energy above hull 0 eV/atom), i.e. stable.
What is the crystal structure of BCl3?
The reference structure of Boron trichloride (BCl3) is hexagonal symmetry, space group P63/m (No. 176).
What is the density of BCl3?
The computed density of the ground-state structure of Boron trichloride (BCl3) is 1.77 g/cm³.
How many polymorphs of BCl3 are known?
85 structures of BCl3 are reported across 5 databases, spanning 20 distinct space groups.
What elements does BCl3 contain?
Boron trichloride (BCl3) contains B and Cl (2 elements).
Where does the data for BCl3 come from?
BCl3 data is cross-referenced from oqmd, materials_project, jarvis, mpaloe.
Comparison

How It Compares

As a primary halide of boron, this compound stands as a fundamental reference point for boron-based chemical precursors, maintaining high thermodynamic stability that ensures reliability in demanding industrial applications.

Data sources & attribution
  • oqmd — Data from the OQMD (oqmd.org). Cite: Saal et al., JOM 65, 1501 (2013); Kirklin et al., npj Comp. Mater. 1, 15010 (2015). (CC-BY-4.0)
  • materials_project — Data from the Materials Project (materialsproject.org). Cite: Jain et al., APL Materials 1, 011002 (2013). (CC-BY-4.0)
  • jarvis — Data from JARVIS (jarvis.nist.gov), NIST. Cite: Choudhary et al., npj Comp. Mater. 6, 173 (2020). (LicenseRef-US-Gov-PD)
  • mpaloe — Data from MP-ALOE. Cite: Kuner et al., npj Comput. Mater. (2025), doi:10.1038/s41524-025-01834-9.

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Polymorph comparison, confidence scoring, supply-chain risk, and patent monitoring — across 85 source databases.

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