BBr3

Boron tribromide · Boron bromide

Boron tribromide is a stable, insulating inorganic compound primarily used as a strong Lewis acid in chemical synthesis and semiconductor manufacturing.

BBr
Crystal structure of BBr3 (hexagonal, P63/m (No. 176))
Ground-state structure · Materials Project
Overview

About Boron tribromide

Boron tribromide is a significant inorganic compound characterized by its insulating electronic nature and high thermodynamic stability. It serves as a vital reagent in organic synthesis, particularly valued for its potent Lewis acidity in various catalytic and transformative processes.

Due to its unique chemical properties, this compound is widely utilized in the semiconductor industry and as a precursor for specialized chemical manufacturing. Its stability on the convex hull underscores its reliability as a foundational material in industrial chemical applications.

At a glance

Key Properties

Cross-validated computational properties for Boron tribromide, aggregated across 5 databases.

Band Gap

3.19–3.87 eV
Range across DFT structures · ground state: insulator

Energy Above Hull

0.000 eV/atom
Best (lowest) across sources

Stability

Stable
3 DFT sources

Structures

34
5 databases, 11 space groups
Validation

Cross-Source DFT Agreement

How well independent DFT databases agree on the thermodynamics of BBr3. Tight agreement means computed properties can be trusted without re-running calculations.

Agreement Score

1.00 / 1.00
Trust tier: high

Hull Spread

0.000 eV
EAH spread across sources

Sources Compared

3
jarvis, materials_project, oqmd

Space Group Consensus

—
Crystallography

Reported Structures

Lowest-energy structures reported for BBr3, ranked by energy above hull.

Space GroupCrystal SystemBand Gap (eV)E above hull (eV/atom)E/atom (eV)Density (g/cm³)
——3.870.0000-0.762—
P63/m (No. 176)hexagonal3.840.0000-3.8253.16
P1 (No. 1)triclinic3.470.0000-0.495—
——3.810.0018-0.761—
——3.860.0047-0.758—
P63/m (No. 176)hexagonal3.690.0142-0.481—
Cm (No. 8)monoclinic3.190.0207-0.475—
P-62m (No. 189)hexagonal3.320.0373-0.458—
——3.670.0759-0.687—
——3.410.0798-0.683—
——0.001.00540.243—
——0.001.52140.759—
Uses

Applications

Where Boron tribromide is used.

Dopant source in semiconductor fabricationLewis acid catalyst in organic synthesisReagent for the cleavage of ethersPrecursor for boron-containing materials
Reference

Frequently Asked Questions

Common questions about Boron tribromide, answered from cross-validated data.

What is BBr3?

Boron tribromide is a stable, insulating inorganic compound primarily used as a strong Lewis acid in chemical synthesis and semiconductor manufacturing.

More questions
What is BBr3 used for?
Boron tribromide (BBr3) is used in dopant source in semiconductor fabrication, lewis acid catalyst in organic synthesis, reagent for the cleavage of ethers, and precursor for boron-containing materials.
What is the band gap of BBr3?
Boron tribromide (BBr3) has a DFT-computed band gap of 3.19–3.87 eV across 34 reported structures. Standard DFT underestimates band gaps, so the measured gap is typically larger.
Is BBr3 a metal, semiconductor, or insulator?
DFT predicts a wide band gap of up to 3.87 eV (an insulator or wide-band-gap material).
Is BBr3 thermodynamically stable?
Yes — Boron tribromide (BBr3) sits on the convex hull (energy above hull 0 eV/atom), i.e. stable.
What is the crystal structure of BBr3?
The reference structure of Boron tribromide (BBr3) is hexagonal symmetry, space group P63/m (No. 176).
What is the density of BBr3?
The computed density of the ground-state structure of Boron tribromide (BBr3) is 3.16 g/cm³.
How many polymorphs of BBr3 are known?
34 structures of BBr3 are reported across 5 databases, spanning 11 distinct space groups.
What elements does BBr3 contain?
Boron tribromide (BBr3) contains B and Br (2 elements).
Where does the data for BBr3 come from?
BBr3 data is cross-referenced from oqmd, materials_project, jarvis, mpaloe, cod.
Comparison

How It Compares

As a prominent member of the boron trihalide family, boron tribromide functions as a powerful Lewis acid, often demonstrating higher reactivity in specific cleavage reactions compared to its lighter halogenated counterparts.

Data sources & attribution
  • oqmd — Data from the OQMD (oqmd.org). Cite: Saal et al., JOM 65, 1501 (2013); Kirklin et al., npj Comp. Mater. 1, 15010 (2015). (CC-BY-4.0)
  • materials_project — Data from the Materials Project (materialsproject.org). Cite: Jain et al., APL Materials 1, 011002 (2013). (CC-BY-4.0)
  • jarvis — Data from JARVIS (jarvis.nist.gov), NIST. Cite: Choudhary et al., npj Comp. Mater. 6, 173 (2020). (LicenseRef-US-Gov-PD)
  • mpaloe — Data from MP-ALOE. Cite: Kuner et al., npj Comput. Mater. (2025), doi:10.1038/s41524-025-01834-9.
  • cod — Data from the Crystallography Open Database (crystallography.net/cod/). Cite: Grazulis et al., J. Appl. Cryst. 42, 726 (2009). (CC0-1.0)

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