TaN
Tantalum nitride · Tantalum(III) nitride
Tantalum nitride is a hard, refractory ceramic material known for its high chemical stability and mechanical durability. It is frequently utilized in microelectronics and thin-film technology due to its excellent barrier properties against metal diffusion.
Key Properties
Cross-validated computational properties for Tantalum nitride, aggregated across 4 databases.
Band GapEnergy needed to move an electron from the valence band to the conduction band. Lower or zero values tend to behave more metallic; larger gaps are more insulating or semiconducting.
Energy Above HullThermodynamic distance from the most stable set of competing phases. 0 eV/atom is on the convex hull; small positive values may still be experimentally accessible.
StabilityA plain-language summary of the best reported energy-above-hull result. It reflects whether the lowest-energy structure is on, near, or far from the stability hull.
StructuresCount of reported calculated crystal structures for this formula, including alternate polymorphs, source databases, and observed space groups.
Reported Structures
Lowest-energy structures reported for TaN, ranked by energy above hull.
| Space GroupSymmetry classification of the crystal arrangement. The number is the international space-group index. | Crystal SystemBroad lattice family, such as cubic, tetragonal, monoclinic, or triclinic, derived from unit-cell symmetry. | Band Gap (eV)Electronic gap calculated for this specific reported structure, measured in electronvolts. | E above hull (eV/atom)Thermodynamic distance from the convex hull for this structure, normalized per atom. Lower is generally more stable. | E/atom (eV)Computed total energy normalized per atom. Use energy above hull, not this value alone, when comparing stability. | Density (g/cm³)Mass per relaxed crystal volume, reported in grams per cubic centimeter. |
|---|---|---|---|---|---|
| P-62m (No. 189) | hexagonal | 0.00 | 0.0000 | -30.219 | 14.18 |
| P-6m2 (No. 187) | hexagonal | 0.00 | 0.0206 | -30.198 | 14.96 |
| P63/mmc (No. 194) | hexagonal | 0.00 | 0.2425 | -29.977 | 14.80 |
| Fm-3m (No. 225) | cubic | 0.00 | 0.3289 | -29.890 | 14.97 |
| P6/mmm (No. 191) | hexagonal | 0.00 | 0.4516 | -29.767 | 13.81 |
| P1 (No. 1) | triclinic | 0.03 | 0.4633 | -29.756 | 12.93 |
| F-43m (No. 216) | cubic | 0.00 | 0.4917 | -29.727 | 11.99 |
| P1 (No. 1) | triclinic | 0.04 | 0.5015 | -29.718 | 12.67 |
| P1 (No. 1) | triclinic | 0.00 | 0.5044 | -29.715 | 11.98 |
| P1 (No. 1) | triclinic | 0.00 | 0.5161 | -29.703 | 12.53 |
| P1 (No. 1) | triclinic | 0.04 | 0.5188 | -29.700 | 12.60 |
| Pm-3m (No. 221) | cubic | 0.00 | 0.8163 | -29.403 | 15.49 |
Applications
Where Tantalum nitride is used.
Frequently Asked Questions
Common questions about Tantalum nitride, answered from cross-validated data.
What is TaN?
Tantalum nitride is a hard, refractory ceramic material known for its high chemical stability and mechanical durability. It is frequently utilized in microelectronics and thin-film technology due to its excellent barrier properties against metal diffusion.
What is TaN used for?
What is the band gap of TaN?
Is TaN a metal, semiconductor, or insulator?
Is TaN thermodynamically stable?
What is the crystal structure of TaN?
What is the density of TaN?
How many polymorphs of TaN are known?
What elements does TaN contain?
Where does the data for TaN come from?
Related Compounds
Other Ultra-High-Temperature Ceramics in the database.
Data sources & attribution
- materials_project — Data from the Materials Project. Cite: Jain et al., APL Materials 1, 011002 (2013).
- jarvis — Data from JARVIS (NIST). Cite: Choudhary et al., npj Comp. Mater. 6, 173 (2020).
- mpaloe — Data from mpaloe.
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