Hf3N4

Hf3N4 is a stable, semiconducting ultra-high-temperature ceramic material characterized by its robust structural properties.

Crystal structure of Hf3N4 (orthorhombic, Pnma (No. 62))
Ground-state structure · Materials Project
Overview

About Hf3N4

Hafnium nitride, specifically the Hf3N4 stoichiometry, represents a significant member of the ultra-high-temperature ceramic family. Its electronic character as a semiconductor distinguishes it from many metallic nitrides, offering unique potential for specialized electronic applications in harsh conditions.

As a thermodynamically stable phase residing on the convex hull, this compound exhibits robust structural integrity. With extensive documentation across multiple databases, it is a well-characterized material of interest for researchers seeking high-performance ceramics capable of maintaining stability under extreme thermal stress.

At a glance

Key Properties

Cross-validated computational properties for Hf3N4, aggregated across 4 databases.

Band Gap

0.92–1.26 eV
Range across DFT structures

Energy Above Hull

0.000 eV/atom
Best (lowest) across sources

Stability

On hull (stable)
3 DFT sources

Structures

65
4 databases, 14 space groups
Crystallography

Reported Structures

Lowest-energy structures reported for Hf3N4, ranked by energy above hull.

Space GroupCrystal SystemBand Gap (eV)E above hull (eV/atom)E/atom (eV)Density (g/cm³)
Pnma (No. 62)orthorhombic1.260.0000-26.54111.71
Fd-3m (No. 227)cubic0.920.0187-26.52210.72
I-43d (No. 220)cubic1.030.0692-26.47212.97
R-3m (No. 166)trigonal1.090.0735-26.46711.60
I4mm (No. 107)Tetragonal13.66
Fd-3m (No. 227)Cubic10.72
P-1 (No. 2)Triclinic5.02
P-1 (No. 2)Triclinic6.32
P-1 (No. 2)Triclinic9.11
I-43d (No. 220)Cubic12.97
I-43d (No. 220)Cubic13.65
I-43d (No. 220)Cubic13.20
Uses

Applications

Where Hf3N4 is used.

High-temperature electronicsRefractory coatingsExtreme environment sensors
Reference

Frequently Asked Questions

Common questions about Hf3N4, answered from cross-validated data.

What is Hf3N4?

Hf3N4 is a stable, semiconducting ultra-high-temperature ceramic material characterized by its robust structural properties.

More questions
What is Hf3N4 used for?
Hf3N4 is used in high-temperature electronics, refractory coatings, and extreme environment sensors.
What is the band gap of Hf3N4?
Hf3N4 has a DFT-computed band gap of 0.92–1.26 eV across 65 reported structures.
Is Hf3N4 a metal, semiconductor, or insulator?
With a band gap up to 1.26 eV it is a semiconductor.
Is Hf3N4 thermodynamically stable?
Yes — Hf3N4 sits on the convex hull (energy above hull 0 eV/atom), i.e. on hull (stable).
What is the crystal structure of Hf3N4?
The lowest-energy reported polymorph of Hf3N4 is orthorhombic symmetry, space group Pnma (No. 62).
What is the density of Hf3N4?
The computed density of the ground-state structure of Hf3N4 is 11.71 g/cm³.
How many polymorphs of Hf3N4 are known?
65 structures of Hf3N4 are reported across 4 databases, spanning 14 distinct space groups.
What elements does Hf3N4 contain?
Hf3N4 contains Hf and N (2 elements).
Where does the data for Hf3N4 come from?
Hf3N4 data is cross-referenced from materials_project, mpaloe.
Comparison

How It Compares

Within the ultra-high-temperature ceramics class.

Within the class of ultra-high-temperature ceramics, Hf3N4 occupies a distinct niche compared to more common refractory carbides like HfC or ZrC. While many siblings in this group, such as TaN or various zirconium-carbon phases, often display metallic behavior, Hf3N4 provides a semiconducting alternative that broadens the design space for high-temperature electronic components.

Explore

Related Compounds

Other Ultra-High-Temperature Ceramics in the database.

Data sources & attribution
  • materials_project — Data from the Materials Project. Cite: Jain et al., APL Materials 1, 011002 (2013).
  • mpaloe — Data from mpaloe.

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