XeF2

Xenon difluoride · Xenon(II) fluoride

Xenon difluoride is a stable, reactive noble gas compound widely utilized as a potent fluorinating agent in chemical synthesis and semiconductor etching.

FXe
Crystal structure of XeF2 (tetragonal, I4/mmm (No. 139))
Ground-state structure · Materials Project
Overview

About Xenon difluoride

Xenon difluoride is a notable noble gas compound that defies the traditional chemical inertness associated with its constituent element. It exists as a thermodynamically stable solid under ambient conditions and is recognized for its semiconducting electronic behavior, which distinguishes it from more conventional insulating fluoride salts.

Due to its high reactivity as a fluorinating agent, this compound is highly valued in specialized industrial and laboratory settings. It serves as a critical reagent for selective chemical etching and the synthesis of complex fluorinated organic and inorganic materials, benefiting from its ability to provide reactive fluorine species under mild conditions.

At a glance

Key Properties

Cross-validated computational properties for Xenon difluoride, aggregated across 4 databases.

Band Gap

2.69 eV
Range across DFT structures

Energy Above Hull

0.000 eV/atom
Best (lowest) across sources

Stability

On hull (stable)
2 DFT sources

Structures

9
4 databases, 4 space groups
Crystallography

Reported Structures

Lowest-energy structures reported for XeF2, ranked by energy above hull.

Space GroupCrystal SystemBand Gap (eV)E above hull (eV/atom)E/atom (eV)Density (g/cm³)
I4/mmm (No. 139)tetragonal2.690.0000-2.0704.40
I4/mmm (No. 139)
P1 (No. 1)Triclinic3.94
P21 (No. 4)Monoclinic4.11
P1 (No. 1)Triclinic2.83
P1 (No. 1)Triclinic4.27
P21/c (No. 14)monoclinic1.68
P1 (No. 1)Triclinic2.63
P1 (No. 1)Triclinic3.58
Uses

Applications

Where Xenon difluoride is used.

Fluorinating agentChemical etching of siliconOxidizing agent in organic synthesisMicroelectromechanical systems fabrication
Reference

Frequently Asked Questions

Common questions about Xenon difluoride, answered from cross-validated data.

What is XeF2?

Xenon difluoride is a stable, reactive noble gas compound widely utilized as a potent fluorinating agent in chemical synthesis and semiconductor etching.

More questions
What is XeF2 used for?
Xenon difluoride (XeF2) is used in fluorinating agent, chemical etching of silicon, oxidizing agent in organic synthesis, and microelectromechanical systems fabrication.
What is the band gap of XeF2?
Xenon difluoride (XeF2) has a DFT-computed band gap of 2.69 eV across 9 reported structures.
Is XeF2 a metal, semiconductor, or insulator?
With a band gap up to 2.69 eV it is a semiconductor.
Is XeF2 thermodynamically stable?
Yes — Xenon difluoride (XeF2) sits on the convex hull (energy above hull 0 eV/atom), i.e. on hull (stable).
What is the crystal structure of XeF2?
The lowest-energy reported polymorph of Xenon difluoride (XeF2) is tetragonal symmetry, space group I4/mmm (No. 139).
What is the density of XeF2?
The computed density of the ground-state structure of Xenon difluoride (XeF2) is 4.40 g/cm³.
How many polymorphs of XeF2 are known?
9 structures of XeF2 are reported across 4 databases, spanning 4 distinct space groups.
What elements does XeF2 contain?
Xenon difluoride (XeF2) contains F and Xe (2 elements).
Where does the data for XeF2 come from?
XeF2 data is cross-referenced from materials_project, jarvis, mpaloe, cod.
Comparison

How It Compares

As a primary noble gas fluoride, Xenon difluoride serves as the foundational reference point for the reactivity and structural chemistry of xenon-based compounds, representing a stable and well-characterized benchmark in the study of hypervalent bonding.

Data sources & attribution
  • materials_project — Data from the Materials Project. Cite: Jain et al., APL Materials 1, 011002 (2013).
  • jarvis — Data from JARVIS (NIST). Cite: Choudhary et al., npj Comp. Mater. 6, 173 (2020).
  • mpaloe — Data from mpaloe.
  • cod — Data from the Crystallography Open Database. Cite: Grazulis et al., Nucleic Acids Res. 40, D420 (2012).

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