WF6
Tungsten hexafluoride · Tungsten(VI) fluoride
Tungsten hexafluoride is a stable, insulating inorganic compound used extensively as a precursor for depositing tungsten metal in semiconductor fabrication.
About Tungsten hexafluoride
Tungsten hexafluoride is a highly significant inorganic compound characterized by its insulating electronic nature and exceptional thermodynamic stability. Its ability to remain stable on the convex hull makes it a reliable precursor in industrial chemical processes.
Due to its unique chemical properties, this compound is widely employed in the semiconductor industry. It serves as a critical source of tungsten for the deposition of thin films, which are essential for creating conductive pathways in modern microelectronic devices.
Key Properties
Cross-validated computational properties for Tungsten hexafluoride, aggregated across 3 databases.
Band GapEnergy needed to move an electron from the valence band to the conduction band. Lower or zero values tend to behave more metallic; larger gaps are more insulating or semiconducting.
Energy Above HullThermodynamic distance from the most stable set of competing phases. 0 eV/atom is on the convex hull; small positive values may still be experimentally accessible.
StabilityA plain-language summary of the best reported energy-above-hull result. It reflects whether the lowest-energy structure is on, near, or far from the stability hull.
StructuresCount of reported calculated crystal structures for this formula, including alternate polymorphs, source databases, and observed space groups.
Applications
Where Tungsten hexafluoride is used.
Patent Landscape
4 patents reference WF6 or close compositional variants.
| Patent | Title | Assignee | Granted |
|---|---|---|---|
| 5963828 | Method for tungsten nucleation from WF.sub.6 using titanium as a reducing agent | — | — |
| 4751101 | Low stress tungsten films by silicon reduction of WF.sub.6 | — | — |
| 9748105 | Tungsten deposition with tungsten hexafluoride (WF6) etchback | — | — |
| 5997949 | Synthesis of W-Si-N films by chemical vapor deposition using WF.sub.6, SiH.sub.4 and NH.sub.3 | — | — |
Frequently Asked Questions
Common questions about Tungsten hexafluoride, answered from cross-validated data.
What is WF6?
Tungsten hexafluoride is a stable, insulating inorganic compound used extensively as a precursor for depositing tungsten metal in semiconductor fabrication.
What is WF6 used for?
What is the band gap of WF6?
Is WF6 a metal, semiconductor, or insulator?
Is WF6 thermodynamically stable?
How many polymorphs of WF6 are known?
What elements does WF6 contain?
Where does the data for WF6 come from?
How It Compares
As a standalone member of its chemical class in this context, tungsten hexafluoride is distinguished by its high degree of structural characterization across multiple databases, reflecting its status as a foundational material for advanced thin-film manufacturing.
Data sources & attribution
- latticegraph — Lattice Graph Materials Intelligence Platform
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