V4O7F5

V4O7F5 is a semiconducting vanadium oxyfluoride that is theoretically stable and structurally diverse.

FOV
Crystal structure of V4O7F5 (triclinic, P1 (No. 1))
Ground-state structure · Materials Project
Overview

About V4O7F5

V4O7F5 is a complex oxyfluoride compound comprising vanadium, oxygen, and fluorine. Its electronic structure classifies it as a semiconductor, positioning it as a subject of interest for advanced functional material research.

Due to its near-hull thermodynamic stability, this compound is considered a promising candidate for experimental synthesis. The significant number of reported structures suggests a rich configurational landscape that warrants further investigation into its physical properties.

At a glance

Key Properties

Cross-validated computational properties for V4O7F5, aggregated across 2 databases.

Band Gap

0.07–0.41 eV
Range across DFT structures · ground state: wide gap

Energy Above Hull

0.000 eV/atom
Best (lowest) across sources

Stability

Stable
2 DFT sources

Structures

38
2 databases, 3 space groups
Validation

Cross-Source DFT Agreement

How well independent DFT databases agree on the thermodynamics of V4O7F5. Tight agreement means computed properties can be trusted without re-running calculations.

Agreement Score

0.97 / 1.00
Trust tier: medium

Hull Spread

0.008 eV
EAH spread across sources

Sources Compared

2
jarvis, materials_project

Space Group Consensus

—
Crystallography

Reported Structures

Lowest-energy structures reported for V4O7F5, ranked by energy above hull.

Space GroupCrystal SystemBand Gap (eV)E above hull (eV/atom)E/atom (eV)Density (g/cm³)
P1 (No. 1)triclinic0.000.0000-2.641—
C2 (No. 5)monoclinic0.000.0018-2.639—
P1 (No. 1)triclinic1.130.0082-7.5903.48
P1 (No. 1)triclinic0.000.0084-7.5903.51
P1 (No. 1)triclinic0.000.0114-2.629—
P1 (No. 1)triclinic0.630.0157-7.5833.56
P1 (No. 1)triclinic0.680.0177-7.5813.46
P1 (No. 1)triclinic1.550.0182-7.5803.55
P1 (No. 1)triclinic1.430.0196-7.5793.25
C2 (No. 5)monoclinic0.000.0275-7.5713.39
P1 (No. 1)triclinic0.140.0290-2.612—
P1 (No. 1)triclinic0.000.0364-2.604—
Uses

Applications

Where V4O7F5 is used.

Solid-state electronic researchMaterials science explorationAdvanced inorganic synthesis
Reference

Frequently Asked Questions

Common questions about V4O7F5, answered from cross-validated data.

What is V4O7F5?

V4O7F5 is a semiconducting vanadium oxyfluoride that is theoretically stable and structurally diverse.

More questions
What is V4O7F5 used for?
V4O7F5 is used in solid-state electronic research, materials science exploration, and advanced inorganic synthesis.
What is the band gap of V4O7F5?
V4O7F5 has a DFT-computed band gap of 0.07–0.41 eV across 38 reported structures. Standard DFT underestimates band gaps, so the measured gap is typically larger.
Is V4O7F5 a metal, semiconductor, or insulator?
DFT predicts a band gap of up to 0.41 eV (a semiconductor). Measured gaps are typically larger.
Is V4O7F5 thermodynamically stable?
Yes — V4O7F5 sits on the convex hull (energy above hull 0 eV/atom), i.e. stable.
What is the crystal structure of V4O7F5?
The reference structure of V4O7F5 is triclinic symmetry, space group P1 (No. 1).
How many polymorphs of V4O7F5 are known?
38 structures of V4O7F5 are reported across 2 databases, spanning 3 distinct space groups.
What elements does V4O7F5 contain?
V4O7F5 contains F, O, and V (3 elements).
Where does the data for V4O7F5 come from?
V4O7F5 data is cross-referenced from jarvis, materials_project.
Comparison

How It Compares

As a unique oxyfluoride, V4O7F5 occupies a specialized niche within inorganic chemistry. Unlike more common binary oxides, its mixed-anion framework allows for tunable electronic characteristics, providing a distinct structural profile compared to simpler vanadium-based compounds.

Data sources & attribution
  • jarvis — Data from JARVIS (jarvis.nist.gov), NIST. Cite: Choudhary et al., npj Comp. Mater. 6, 173 (2020). (LicenseRef-US-Gov-PD)
  • materials_project — Data from the Materials Project (materialsproject.org). Cite: Jain et al., APL Materials 1, 011002 (2013). (CC-BY-4.0)

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