UOF4

UOF4 is a semiconducting uranium oxyfluoride compound that is considered a stable candidate for experimental synthesis.

FOU
Crystal structure of UOF4 (trigonal, R3m (No. 160))
Ground-state structure · Materials Project
Overview

About UOF4

UOF4 is an inorganic compound composed of uranium, oxygen, and fluorine. It exhibits semiconducting electronic properties and is recognized for its structural versatility, with multiple reported configurations across crystallographic databases. Its position near the thermodynamic hull suggests that it is a viable target for experimental synthesis and characterization in materials science. As a member of the uranium oxyfluoride family, this compound is of significant interest for understanding actinide chemistry and the behavior of complex fluoride-oxide systems. Its stability profile makes it a compelling subject for researchers investigating advanced fuel cycles or specialized chemical precursors.

At a glance

Key Properties

Cross-validated computational properties for UOF4, aggregated across 3 databases.

Band Gap

2.42–3.79 eV
Range across DFT structures · ground state: wide gap

Energy Above Hull

0.000 eV/atom
Best (lowest) across sources

Stability

Stable
3 DFT sources

Structures

9
3 databases, 2 space groups
Validation

Cross-Source DFT Agreement

How well independent DFT databases agree on the thermodynamics of UOF4. Tight agreement means computed properties can be trusted without re-running calculations.

Agreement Score

0.51 / 1.00
Trust tier: low

Hull Spread

0.123 eV
EAH spread across sources

Sources Compared

3
jarvis, materials_project, oqmd

Space Group Consensus

All match
Crystallography

Reported Structures

Lowest-energy structures reported for UOF4, ranked by energy above hull.

Space GroupCrystal SystemBand Gap (eV)E above hull (eV/atom)E/atom (eV)Density (g/cm³)
R3m (No. 160)trigonal2.550.0000-3.358—
R3m (No. 160)trigonal2.470.0246-7.6405.75
I-42d (No. 122)tetragonal1.950.0940-7.5705.31
——3.790.1231-3.404—
——2.420.3045-3.223—
R3m (No. 160)trigonal———5.87
I-42d (No. 122)tetragonal———5.39
I-42d (No. 122)tetragonal———5.58
I-42d (No. 122)tetragonal———5.31
R3m (No. 160)trigonal———5.49
R3m (No. 160)trigonal———5.40
R3m (No. 160)trigonal———5.71
Uses

Applications

Where UOF4 is used.

Nuclear materials researchActinide chemistry studiesAdvanced chemical precursor development
Reference

Frequently Asked Questions

Common questions about UOF4, answered from cross-validated data.

What is UOF4?

UOF4 is a semiconducting uranium oxyfluoride compound that is considered a stable candidate for experimental synthesis.

More questions
What is UOF4 used for?
UOF4 is used in nuclear materials research, actinide chemistry studies, and advanced chemical precursor development.
What is the band gap of UOF4?
UOF4 has a DFT-computed band gap of 2.42–3.79 eV across 9 reported structures. Standard DFT underestimates band gaps, so the measured gap is typically larger.
Is UOF4 a metal, semiconductor, or insulator?
DFT predicts a wide band gap of up to 3.79 eV (an insulator or wide-band-gap material).
Is UOF4 thermodynamically stable?
Yes — UOF4 sits on the convex hull (energy above hull 0 eV/atom), i.e. stable.
What is the crystal structure of UOF4?
The reference structure of UOF4 is trigonal symmetry, space group R3m (No. 160).
How many polymorphs of UOF4 are known?
9 structures of UOF4 are reported across 3 databases, spanning 2 distinct space groups.
What elements does UOF4 contain?
UOF4 contains F, O, and U (3 elements).
Where does the data for UOF4 come from?
UOF4 data is cross-referenced from jarvis, materials_project, oqmd, cod, mpaloe.
Comparison

How It Compares

As a unique uranium-based oxyfluoride, UOF4 occupies a distinct niche in the study of actinide compounds. While it lacks direct structural siblings in this specific dataset, it serves as a critical reference point for evaluating the stability and electronic behavior of uranium-based halides and oxides, helping to map the broader chemical landscape of the actinide series.

Data sources & attribution
  • jarvis — Data from JARVIS (jarvis.nist.gov), NIST. Cite: Choudhary et al., npj Comp. Mater. 6, 173 (2020). (LicenseRef-US-Gov-PD)
  • materials_project — Data from the Materials Project (materialsproject.org). Cite: Jain et al., APL Materials 1, 011002 (2013). (CC-BY-4.0)
  • oqmd — Data from the OQMD (oqmd.org). Cite: Saal et al., JOM 65, 1501 (2013); Kirklin et al., npj Comp. Mater. 1, 15010 (2015). (CC-BY-4.0)
  • cod — Data from the Crystallography Open Database (crystallography.net/cod/). Cite: Grazulis et al., J. Appl. Cryst. 42, 726 (2009). (CC0-1.0)
  • mpaloe — Data from MP-ALOE. Cite: Kuner et al., npj Comput. Mater. (2025), doi:10.1038/s41524-025-01834-9.

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