SnF4

tin(IV) fluoride · stannic fluoride

Tin(IV) fluoride is a stable, insulating inorganic compound containing tin and fluorine that is primarily utilized in chemical synthesis.

FSn
Crystal structure of SnF4 (tetragonal, I4/mmm (No. 139))
Ground-state structure · Materials Project
Overview

About tin(IV) fluoride

Tin(IV) fluoride is a robust inorganic compound characterized by its insulating electronic nature. As a thermodynamically stable phase, it maintains structural integrity under standard conditions, making it a reliable subject for fundamental materials research.

With extensive structural data available across multiple databases, this compound serves as a key reference point for tin-based fluorides. Its chemical behavior is defined by the high electronegativity of fluorine coupled with the tetravalent state of tin, facilitating its use in specialized chemical processes.

At a glance

Key Properties

Cross-validated computational properties for tin(IV) fluoride, aggregated across 3 databases.

Band Gap

1.33–3.60 eV
Range across DFT structures · ground state: insulator

Energy Above Hull

0.000 eV/atom
Best (lowest) across sources

Stability

Stable
3 DFT sources

Structures

59
3 databases, 14 space groups
Validation

Cross-Source DFT Agreement

How well independent DFT databases agree on the thermodynamics of SnF4. Tight agreement means computed properties can be trusted without re-running calculations.

Agreement Score

1.00 / 1.00
Trust tier: high

Hull Spread

0.000 eV
EAH spread across sources

Sources Compared

3
jarvis, materials_project, oqmd

Space Group Consensus

All match
Crystallography

Reported Structures

Lowest-energy structures reported for SnF4, ranked by energy above hull.

Space GroupCrystal SystemBand Gap (eV)E above hull (eV/atom)E/atom (eV)Density (g/cm³)
——3.400.0000-2.659—
I4/mmm (No. 139)tetragonal3.160.0000-2.445—
I4/mmm (No. 139)tetragonal3.110.0000-5.0415.00
——3.600.0193-2.640—
——2.230.0369-2.623—
——3.500.0576-2.602—
C2/c (No. 15)monoclinic3.370.0580-2.387—
C2/c (No. 15)monoclinic3.370.0581-2.387—
C2/c (No. 15)monoclinic3.370.0581-2.387—
——3.480.0696-2.590—
——1.810.0777-2.582—
——3.170.0790-2.580—
Uses

Applications

Where tin(IV) fluoride is used.

fluorinating agentchemical synthesiscatalyst precursor
Reference

Frequently Asked Questions

Common questions about tin(IV) fluoride, answered from cross-validated data.

What is SnF4?

Tin(IV) fluoride is a stable, insulating inorganic compound containing tin and fluorine that is primarily utilized in chemical synthesis.

More questions
What is SnF4 used for?
tin(IV) fluoride (SnF4) is used in fluorinating agent, chemical synthesis, and catalyst precursor.
What is the band gap of SnF4?
tin(IV) fluoride (SnF4) has a DFT-computed band gap of 1.33–3.60 eV across 59 reported structures. Standard DFT underestimates band gaps, so the measured gap is typically larger.
Is SnF4 a metal, semiconductor, or insulator?
DFT predicts a wide band gap of up to 3.60 eV (an insulator or wide-band-gap material).
Is SnF4 thermodynamically stable?
Yes — tin(IV) fluoride (SnF4) sits on the convex hull (energy above hull 0 eV/atom), i.e. stable.
What is the crystal structure of SnF4?
The reference structure of tin(IV) fluoride (SnF4) is tetragonal symmetry, space group I4/mmm (No. 139).
How many polymorphs of SnF4 are known?
59 structures of SnF4 are reported across 3 databases, spanning 14 distinct space groups.
What elements does SnF4 contain?
tin(IV) fluoride (SnF4) contains F and Sn (2 elements).
Where does the data for SnF4 come from?
SnF4 data is cross-referenced from oqmd, jarvis, materials_project, mpaloe, cod.
Comparison

How It Compares

As a standalone representative of its specific tin-fluoride chemistry, this compound serves as a critical benchmark for understanding the stability and insulating characteristics of tetravalent metal halides.

Data sources & attribution
  • oqmd — Data from the OQMD (oqmd.org). Cite: Saal et al., JOM 65, 1501 (2013); Kirklin et al., npj Comp. Mater. 1, 15010 (2015). (CC-BY-4.0)
  • jarvis — Data from JARVIS (jarvis.nist.gov), NIST. Cite: Choudhary et al., npj Comp. Mater. 6, 173 (2020). (LicenseRef-US-Gov-PD)
  • materials_project — Data from the Materials Project (materialsproject.org). Cite: Jain et al., APL Materials 1, 011002 (2013). (CC-BY-4.0)
  • mpaloe — Data from MP-ALOE. Cite: Kuner et al., npj Comput. Mater. (2025), doi:10.1038/s41524-025-01834-9.
  • cod — Data from the Crystallography Open Database (crystallography.net/cod/). Cite: Grazulis et al., J. Appl. Cryst. 42, 726 (2009). (CC0-1.0)

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