Sn3F8

Sn3F8 is a stable, insulating inorganic compound formed from tin and fluorine atoms.

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Crystal structure of Sn3F8 (monoclinic, P21/c (No. 14))
Ground-state structure · Materials Project
Overview

About Sn3F8

Sn3F8 is a distinct inorganic compound composed of tin and fluorine. It is characterized as a wide-band-gap insulator, indicating its electronic behavior is dominated by a lack of free charge carriers under standard conditions. Its status as a thermodynamically stable phase on the convex hull suggests a robust structural arrangement that resists decomposition.

Because of its stability and well-defined structural characteristics, this compound serves as an important reference point in the study of tin-based halide materials. Its presence across multiple structural databases highlights its significance in fundamental materials science research.

At a glance

Key Properties

Cross-validated computational properties for Sn3F8, aggregated across 3 databases.

Band Gap

2.20–3.31 eV
Range across DFT structures · ground state: insulator

Energy Above Hull

0.000 eV/atom
Best (lowest) across sources

Stability

Stable
3 DFT sources

Structures

6
3 databases, 1 space group
Validation

Cross-Source DFT Agreement

How well independent DFT databases agree on the thermodynamics of Sn3F8. Tight agreement means computed properties can be trusted without re-running calculations.

Agreement Score

1.00 / 1.00
Trust tier: high

Hull Spread

0.000 eV
EAH spread across sources

Sources Compared

3
jarvis, materials_project, oqmd

Space Group Consensus

All match
Crystallography

Reported Structures

Lowest-energy structures reported for Sn3F8, ranked by energy above hull.

Space GroupCrystal SystemBand Gap (eV)E above hull (eV/atom)E/atom (eV)Density (g/cm³)
P21/c (No. 14)monoclinic3.310.0000-2.497—
——3.170.0000-2.672—
P21/c (No. 14)monoclinic3.160.0000-5.1924.96
——2.200.1097-2.562—
P21/c (No. 14)monoclinic———4.76
P21/c (No. 14)monoclinic———4.63
P21/c (No. 14)monoclinic———4.47
Uses

Applications

Where Sn3F8 is used.

Fundamental materials science researchStructural chemistry studies
Reference

Frequently Asked Questions

Common questions about Sn3F8, answered from cross-validated data.

What is Sn3F8?

Sn3F8 is a stable, insulating inorganic compound formed from tin and fluorine atoms.

More questions
What is Sn3F8 used for?
Sn3F8 is used in fundamental materials science research and structural chemistry studies.
What is the band gap of Sn3F8?
Sn3F8 has a DFT-computed band gap of 2.20–3.31 eV across 6 reported structures. Standard DFT underestimates band gaps, so the measured gap is typically larger.
Is Sn3F8 a metal, semiconductor, or insulator?
DFT predicts a wide band gap of up to 3.31 eV (an insulator or wide-band-gap material).
Is Sn3F8 thermodynamically stable?
Yes — Sn3F8 sits on the convex hull (energy above hull 0 eV/atom), i.e. stable.
What is the crystal structure of Sn3F8?
The reference structure of Sn3F8 is monoclinic symmetry, space group P21/c (No. 14).
How many polymorphs of Sn3F8 are known?
6 structures of Sn3F8 are reported across 3 databases, spanning 1 distinct space group.
What elements does Sn3F8 contain?
Sn3F8 contains F and Sn (2 elements).
Where does the data for Sn3F8 come from?
Sn3F8 data is cross-referenced from jarvis, oqmd, materials_project, mpaloe.
Comparison

How It Compares

As a thermodynamically stable tin fluoride, Sn3F8 represents a unique structural configuration within the broader landscape of metal halides. It serves as a foundational example of how tin and fluorine can organize into stable, insulating crystalline frameworks.

Data sources & attribution
  • jarvis — Data from JARVIS (jarvis.nist.gov), NIST. Cite: Choudhary et al., npj Comp. Mater. 6, 173 (2020). (LicenseRef-US-Gov-PD)
  • oqmd — Data from the OQMD (oqmd.org). Cite: Saal et al., JOM 65, 1501 (2013); Kirklin et al., npj Comp. Mater. 1, 15010 (2015). (CC-BY-4.0)
  • materials_project — Data from the Materials Project (materialsproject.org). Cite: Jain et al., APL Materials 1, 011002 (2013). (CC-BY-4.0)
  • mpaloe — Data from MP-ALOE. Cite: Kuner et al., npj Comput. Mater. (2025), doi:10.1038/s41524-025-01834-9.

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