Si2H2O3

This compound is a silicon-based material containing hydrogen and oxygen, often studied in the context of silicon suboxide chemistry. It is primarily utilized in research settings to investigate the structural properties of silicon-based thin films and surface passivation layers.

HOSi
Crystal structure of Si2H2O3 (orthorhombic, Pbca (No. 61))
Ground-state structure · Materials Project
Overview

Key Properties

Cross-validated computational properties for Si2H2O3, aggregated across 2 databases.

Band Gap

1.26–6.79 eV
Range across DFT structures

Energy Above Hull

0.023 eV/atom
Best (lowest) across sources

Stability

Near hull (likely stable)
1 DFT source

Structures

21
2 databases, 4 space groups
Crystallography

Reported Structures

Lowest-energy structures reported for Si2H2O3, ranked by energy above hull.

Space GroupCrystal SystemBand Gap (eV)E above hull (eV/atom)E/atom (eV)Density (g/cm³)
Pbca (No. 61)orthorhombic6.790.0227-6.7681.68
R-3 (No. 148)trigonal6.370.0252-6.7651.76
P1 (No. 1)triclinic1.260.3868-6.4042.00
P1 (No. 1)triclinic1.410.5717-6.2191.88
P1 (No. 1)triclinic2.210.5786-6.2121.74
P1 (No. 1)triclinic1.570.5884-6.2021.84
P1 (No. 1)triclinic1.770.5951-6.1961.80
P1 (No. 1)triclinic1.830.5981-6.1932.01
P1 (No. 1)triclinic1.620.6133-6.1771.87
P1 (No. 1)triclinic1.680.6305-6.1601.82
P1 (No. 1)triclinic1.590.6373-6.1531.86
P1 (No. 1)triclinic1.930.6500-6.1411.83
Uses

Applications

Where Si2H2O3 is used.

Semiconductor researchSurface science studiesThin film development
Reference

Frequently Asked Questions

Common questions about Si2H2O3, answered from cross-validated data.

What is Si2H2O3?

This compound is a silicon-based material containing hydrogen and oxygen, often studied in the context of silicon suboxide chemistry. It is primarily utilized in research settings to investigate the structural properties of silicon-based thin films and surface passivation layers.

More questions
What is Si2H2O3 used for?
Si2H2O3 is used in semiconductor research, surface science studies, and thin film development.
What is the band gap of Si2H2O3?
Si2H2O3 has a DFT-computed band gap of 1.26–6.79 eV across 21 reported structures.
Is Si2H2O3 a metal, semiconductor, or insulator?
With a wide band gap up to 6.79 eV it is an insulator / wide-band-gap material.
Is Si2H2O3 thermodynamically stable?
Si2H2O3 has a lowest energy above hull of 0.023 eV/atom (near hull (likely stable)).
What is the crystal structure of Si2H2O3?
The lowest-energy reported polymorph of Si2H2O3 is orthorhombic symmetry, space group Pbca (No. 61).
What is the density of Si2H2O3?
The computed density of the ground-state structure of Si2H2O3 is 1.68 g/cm³.
How many polymorphs of Si2H2O3 are known?
21 structures of Si2H2O3 are reported across 2 databases, spanning 4 distinct space groups.
What elements does Si2H2O3 contain?
Si2H2O3 contains H, O, and Si (3 elements).
Where does the data for Si2H2O3 come from?
Si2H2O3 data is cross-referenced from materials_project, mpaloe.
Data sources & attribution
  • materials_project — Data from the Materials Project. Cite: Jain et al., APL Materials 1, 011002 (2013).
  • mpaloe — Data from mpaloe.

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