HoOF

HoOF is a thermodynamically stable holmium oxyfluoride that functions as a wide-band-gap insulator.

FHoO
Crystal structure of HoOF (trigonal, R-3m (No. 166))
Ground-state structure · Materials Project
Overview

About HoOF

HoOF is a stable inorganic compound composed of holmium, oxygen, and fluorine. As a wide-band-gap insulator, it exhibits robust electronic characteristics that make it an interesting candidate for specialized dielectric or optical applications where structural integrity is paramount. Its presence on the convex hull confirms its thermodynamic stability, ensuring it remains a reliable subject for fundamental materials research. Given the multiple reported structures, it offers a versatile platform for investigating rare-earth oxyfluoride phases. These materials are frequently explored for their unique luminescence properties and potential use in advanced ceramic or coating technologies.

At a glance

Key Properties

Cross-validated computational properties for HoOF, aggregated across 3 databases.

Band Gap

2.87–5.39 eV
Range across DFT structures · ground state: insulator

Energy Above Hull

0.000 eV/atom
Best (lowest) across sources

Stability

Stable
3 DFT sources

Structures

12
3 databases, 3 space groups
Validation

Cross-Source DFT Agreement

How well independent DFT databases agree on the thermodynamics of HoOF. Tight agreement means computed properties can be trusted without re-running calculations.

Agreement Score

1.00 / 1.00
Trust tier: high

Hull Spread

0.000 eV
EAH spread across sources

Sources Compared

3
jarvis, materials_project, oqmd

Space Group Consensus

All match
Crystallography

Reported Structures

Lowest-energy structures reported for HoOF, ranked by energy above hull.

Space GroupCrystal SystemBand Gap (eV)E above hull (eV/atom)E/atom (eV)Density (g/cm³)
R-3m (No. 166)trigonal5.340.0000-4.159—
——5.240.0000-4.187—
R-3m (No. 166)trigonal5.090.0000-8.0958.63
——5.390.0042-4.183—
——5.140.0129-4.174—
——5.230.0188-4.168—
——5.290.0319-4.155—
——5.100.0508-4.136—
——4.860.0952-4.092—
——2.870.1427-4.044—
P1 (No. 1)triclinic———7.41
P21 (No. 4)monoclinic———7.80
Uses

Applications

Where HoOF is used.

Optical materialsDielectric componentsAdvanced ceramic research
Reference

Frequently Asked Questions

Common questions about HoOF, answered from cross-validated data.

What is HoOF?

HoOF is a thermodynamically stable holmium oxyfluoride that functions as a wide-band-gap insulator.

More questions
What is HoOF used for?
HoOF is used in optical materials, dielectric components, and advanced ceramic research.
What is the band gap of HoOF?
HoOF has a DFT-computed band gap of 2.87–5.39 eV across 12 reported structures. Standard DFT underestimates band gaps, so the measured gap is typically larger.
Is HoOF a metal, semiconductor, or insulator?
DFT predicts a wide band gap of up to 5.39 eV (an insulator or wide-band-gap material).
Is HoOF thermodynamically stable?
Yes — HoOF sits on the convex hull (energy above hull 0 eV/atom), i.e. stable.
What is the crystal structure of HoOF?
The reference structure of HoOF is trigonal symmetry, space group R-3m (No. 166).
How many polymorphs of HoOF are known?
12 structures of HoOF are reported across 3 databases, spanning 3 distinct space groups.
What elements does HoOF contain?
HoOF contains F, Ho, and O (3 elements).
Where does the data for HoOF come from?
HoOF data is cross-referenced from jarvis, oqmd, materials_project, mpaloe.
Comparison

How It Compares

As a rare-earth oxyfluoride, HoOF represents a stable, insulating phase within the broader family of lanthanide-based compounds. While specific sibling comparisons are limited, it serves as a representative example of how holmium-based systems maintain structural stability while providing the wide-gap electronic profile necessary for specialized optical and electronic components.

Data sources & attribution
  • jarvis — Data from JARVIS (jarvis.nist.gov), NIST. Cite: Choudhary et al., npj Comp. Mater. 6, 173 (2020). (LicenseRef-US-Gov-PD)
  • oqmd — Data from the OQMD (oqmd.org). Cite: Saal et al., JOM 65, 1501 (2013); Kirklin et al., npj Comp. Mater. 1, 15010 (2015). (CC-BY-4.0)
  • materials_project — Data from the Materials Project (materialsproject.org). Cite: Jain et al., APL Materials 1, 011002 (2013). (CC-BY-4.0)
  • mpaloe — Data from MP-ALOE. Cite: Kuner et al., npj Comput. Mater. (2025), doi:10.1038/s41524-025-01834-9.

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