HfSO

HfSO is a semiconducting hafnium oxysulfide that is considered a promising candidate for synthesis due to its favorable thermodynamic stability.

HfOS
Crystal structure of HfSO (cubic, P213 (No. 198))
Ground-state structure · Materials Project
Overview

About HfSO

HfSO is an inorganic compound composed of hafnium, sulfur, and oxygen. As a semiconducting material, it occupies a unique position in the landscape of chalcogenide-oxide hybrids, offering distinct electronic properties that differentiate it from pure oxides or sulfides.

Its status as a near-hull material suggests that it is thermodynamically accessible and likely synthesizable under appropriate laboratory conditions. With multiple reported crystal structures, it serves as a valuable candidate for researchers investigating novel functional materials with tunable electronic characteristics.

At a glance

Key Properties

Cross-validated computational properties for HfSO, aggregated across 3 databases.

Band Gap

1.14–2.99 eV
Range across DFT structures · ground state: wide gap

Energy Above Hull

0.000 eV/atom
Best (lowest) across sources

Stability

Stable
3 DFT sources

Structures

7
3 databases, 4 space groups
Validation

Cross-Source DFT Agreement

How well independent DFT databases agree on the thermodynamics of HfSO. Tight agreement means computed properties can be trusted without re-running calculations.

Agreement Score

0.97 / 1.00
Trust tier: high

Hull Spread

0.008 eV
EAH spread across sources

Sources Compared

3
jarvis, materials_project, oqmd

Space Group Consensus

All match
Crystallography

Reported Structures

Lowest-energy structures reported for HfSO, ranked by energy above hull.

Space GroupCrystal SystemBand Gap (eV)E above hull (eV/atom)E/atom (eV)Density (g/cm³)
P213 (No. 198)cubic2.870.0000-2.771—
P213 (No. 198)cubic2.870.0072-9.3068.30
——2.990.0084-2.801—
P4/nmm (No. 129)tetragonal1.070.0608-9.2529.24
——1.140.0610-2.748—
——0.000.4526-2.357—
P21/m (No. 11)monoclinic———8.87
C2/m (No. 12)monoclinic———7.06
P4/nmm (No. 129)tetragonal———11.98
Uses

Applications

Where HfSO is used.

Semiconductor researchMaterials science explorationSolid-state chemistry
Reference

Frequently Asked Questions

Common questions about HfSO, answered from cross-validated data.

What is HfSO?

HfSO is a semiconducting hafnium oxysulfide that is considered a promising candidate for synthesis due to its favorable thermodynamic stability.

More questions
What is HfSO used for?
HfSO is used in semiconductor research, materials science exploration, and solid-state chemistry.
What is the band gap of HfSO?
HfSO has a DFT-computed band gap of 1.14–2.99 eV across 7 reported structures. Standard DFT underestimates band gaps, so the measured gap is typically larger.
Is HfSO a metal, semiconductor, or insulator?
DFT predicts a band gap of up to 2.99 eV (a semiconductor). Measured gaps are typically larger.
Is HfSO thermodynamically stable?
Yes — HfSO sits on the convex hull (energy above hull 0 eV/atom), i.e. stable.
What is the crystal structure of HfSO?
The reference structure of HfSO is cubic symmetry, space group P213 (No. 198).
How many polymorphs of HfSO are known?
7 structures of HfSO are reported across 3 databases, spanning 4 distinct space groups.
What elements does HfSO contain?
HfSO contains Hf, O, and S (3 elements).
Where does the data for HfSO come from?
HfSO data is cross-referenced from jarvis, materials_project, oqmd, mpaloe.
Comparison

How It Compares

As a relatively rare hafnium-based oxysulfide, HfSO represents a niche area of materials exploration. Unlike more common binary hafnium oxides or sulfides, this compound integrates multiple anions to achieve its semiconducting character, positioning it as a specialized subject for structural and electronic studies within the broader family of hafnium-based compounds.

Data sources & attribution
  • jarvis — Data from JARVIS (jarvis.nist.gov), NIST. Cite: Choudhary et al., npj Comp. Mater. 6, 173 (2020). (LicenseRef-US-Gov-PD)
  • materials_project — Data from the Materials Project (materialsproject.org). Cite: Jain et al., APL Materials 1, 011002 (2013). (CC-BY-4.0)
  • oqmd — Data from the OQMD (oqmd.org). Cite: Saal et al., JOM 65, 1501 (2013); Kirklin et al., npj Comp. Mater. 1, 15010 (2015). (CC-BY-4.0)
  • mpaloe — Data from MP-ALOE. Cite: Kuner et al., npj Comput. Mater. (2025), doi:10.1038/s41524-025-01834-9.

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