HfS3

Hafnium trisulfide is a stable semiconducting material used primarily in materials science research for its unique electronic and structural characteristics.

HfS
Crystal structure of HfS3 (monoclinic, P21/m (No. 11))
Ground-state structure · Materials Project
Overview

About HfS3

Hafnium trisulfide is a semiconducting transition metal trichalcogenide that occupies a stable position on the thermodynamic convex hull. Its structural framework allows for unique electronic behavior, making it a subject of significant interest for researchers investigating low-dimensional materials.

Due to its high structural diversity and stability, this compound serves as a critical candidate for exploring anisotropic electronic properties. It is primarily utilized in experimental research settings to understand the fundamental physics of semiconducting chalcogenides.

At a glance

Key Properties

Cross-validated computational properties for HfS3, aggregated across 4 databases.

Band Gap

1.09–1.22 eV
Range across DFT structures · ground state: narrow gap

Energy Above Hull

0.000 eV/atom
Best (lowest) across sources

Stability

Stable
3 DFT sources

Structures

125
4 databases, 21 space groups
Validation

Cross-Source DFT Agreement

How well independent DFT databases agree on the thermodynamics of HfS3. Tight agreement means computed properties can be trusted without re-running calculations.

Agreement Score

1.00 / 1.00
Trust tier: high

Hull Spread

0.000 eV
EAH spread across sources

Sources Compared

3
jarvis, materials_project, oqmd

Space Group Consensus

All match
Crystallography

Reported Structures

Lowest-energy structures reported for HfS3, ranked by energy above hull.

Space GroupCrystal SystemBand Gap (eV)E above hull (eV/atom)E/atom (eV)Density (g/cm³)
——1.220.0000-1.412—
P21/m (No. 11)monoclinic1.180.0000-1.324—
P21/m (No. 11)monoclinic1.120.0000-18.6875.43
P1 (No. 1)triclinic1.090.3223-1.002—
——0.000.6138-0.798—
——0.000.8917-0.521—
——0.000.9434-0.469—
——0.001.2143-0.198—
P1 (No. 1)triclinic———7.12
Cm (No. 8)monoclinic———5.07
P1 (No. 1)triclinic———4.91
P1 (No. 1)triclinic———4.60
Uses

Applications

Where HfS3 is used.

Semiconductor researchElectronic device prototypingFundamental condensed matter physics studies
Reference

Frequently Asked Questions

Common questions about HfS3, answered from cross-validated data.

What is HfS3?

Hafnium trisulfide is a stable semiconducting material used primarily in materials science research for its unique electronic and structural characteristics.

More questions
What is HfS3 used for?
HfS3 is used in semiconductor research, electronic device prototyping, and fundamental condensed matter physics studies.
What is the band gap of HfS3?
HfS3 has a DFT-computed band gap of 1.09–1.22 eV across 125 reported structures. Standard DFT underestimates band gaps, so the measured gap is typically larger.
Is HfS3 a metal, semiconductor, or insulator?
DFT predicts a band gap of up to 1.22 eV (a semiconductor). Measured gaps are typically larger.
Is HfS3 thermodynamically stable?
Yes — HfS3 sits on the convex hull (energy above hull 0 eV/atom), i.e. stable.
What is the crystal structure of HfS3?
The reference structure of HfS3 is monoclinic symmetry, space group P21/m (No. 11).
How many polymorphs of HfS3 are known?
125 structures of HfS3 are reported across 4 databases, spanning 21 distinct space groups.
What elements does HfS3 contain?
HfS3 contains Hf and S (2 elements).
Where does the data for HfS3 come from?
HfS3 data is cross-referenced from oqmd, jarvis, materials_project, mpaloe.
Comparison

How It Compares

As a member of the transition metal trichalcogenide family, HfS3 stands out for its thermodynamic stability, which facilitates reliable synthesis and characterization compared to less stable or metastable counterparts in the broader class of metal sulfides.

Data sources & attribution
  • oqmd — Data from the OQMD (oqmd.org). Cite: Saal et al., JOM 65, 1501 (2013); Kirklin et al., npj Comp. Mater. 1, 15010 (2015). (CC-BY-4.0)
  • jarvis — Data from JARVIS (jarvis.nist.gov), NIST. Cite: Choudhary et al., npj Comp. Mater. 6, 173 (2020). (LicenseRef-US-Gov-PD)
  • materials_project — Data from the Materials Project (materialsproject.org). Cite: Jain et al., APL Materials 1, 011002 (2013). (CC-BY-4.0)
  • mpaloe — Data from MP-ALOE. Cite: Kuner et al., npj Comput. Mater. (2025), doi:10.1038/s41524-025-01834-9.

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