HfNCl

HfNCl is a thermodynamically stable semiconducting compound containing hafnium, nitrogen, and chlorine.

ClHfN
Crystal structure of HfNCl (trigonal, R-3m (No. 166))
Ground-state structure · Materials Project
Overview

About HfNCl

HfNCl is a distinct inorganic compound composed of hafnium, nitrogen, and chlorine. As a thermodynamically stable material situated on the convex hull, it represents a robust structural arrangement that is of significant interest for fundamental research into layered semiconducting systems.

Its electronic character as a semiconductor makes it a subject of investigation for potential electronic and optoelectronic applications. The compound is well-documented in structural databases, reflecting its importance in the study of complex nitrides and halides.

At a glance

Key Properties

Cross-validated computational properties for HfNCl, aggregated across 3 databases.

Band Gap

2.21–2.43 eV
Range across DFT structures · ground state: wide gap

Energy Above Hull

0.000 eV/atom
Best (lowest) across sources

Stability

Stable
3 DFT sources

Structures

11
3 databases, 5 space groups
Validation

Cross-Source DFT Agreement

How well independent DFT databases agree on the thermodynamics of HfNCl. Tight agreement means computed properties can be trusted without re-running calculations.

Agreement Score

1.00 / 1.00
Trust tier: high

Hull Spread

0.000 eV
EAH spread across sources

Sources Compared

3
jarvis, materials_project, oqmd

Space Group Consensus

All match
Crystallography

Reported Structures

Lowest-energy structures reported for HfNCl, ranked by energy above hull.

Space GroupCrystal SystemBand Gap (eV)E above hull (eV/atom)E/atom (eV)Density (g/cm³)
——2.290.0000-2.063—
R-3m (No. 166)trigonal2.230.0000-8.7887.22
R-3m (No. 166)trigonal2.210.0000-2.018—
——2.430.0034-2.059—
P-6m2 (No. 187)hexagonal0.002.19280.175—
——0.002.24870.186—
P-1 (No. 2)triclinic———6.92
P-1 (No. 2)triclinic———9.04
Pmmn (No. 59)orthorhombic———6.40
P-1 (No. 2)triclinic———7.39
P21/m (No. 11)monoclinic———6.29
P21/m (No. 11)monoclinic———6.29
Uses

Applications

Where HfNCl is used.

Semiconductor researchMaterials science explorationSolid-state chemistry studies
Reference

Frequently Asked Questions

Common questions about HfNCl, answered from cross-validated data.

What is HfNCl?

HfNCl is a thermodynamically stable semiconducting compound containing hafnium, nitrogen, and chlorine.

More questions
What is HfNCl used for?
HfNCl is used in semiconductor research, materials science exploration, and solid-state chemistry studies.
What is the band gap of HfNCl?
HfNCl has a DFT-computed band gap of 2.21–2.43 eV across 11 reported structures. Standard DFT underestimates band gaps, so the measured gap is typically larger.
Is HfNCl a metal, semiconductor, or insulator?
DFT predicts a band gap of up to 2.43 eV (a semiconductor). Measured gaps are typically larger.
Is HfNCl thermodynamically stable?
Yes — HfNCl sits on the convex hull (energy above hull 0 eV/atom), i.e. stable.
What is the crystal structure of HfNCl?
The reference structure of HfNCl is trigonal symmetry, space group R-3m (No. 166).
What is the density of HfNCl?
The computed density of the ground-state structure of HfNCl is 7.22 g/cm³.
How many polymorphs of HfNCl are known?
11 structures of HfNCl are reported across 3 databases, spanning 5 distinct space groups.
What elements does HfNCl contain?
HfNCl contains Cl, Hf, and N (3 elements).
Where does the data for HfNCl come from?
HfNCl data is cross-referenced from oqmd, materials_project, jarvis, mpaloe.
Comparison

How It Compares

As a unique member of its chemical family, HfNCl serves as a primary reference point for understanding the interplay between hafnium-based coordination and halide integration. It stands out for its structural stability, providing a baseline for exploring the electronic properties of similar layered ternary systems.

Data sources & attribution
  • oqmd — Data from the OQMD (oqmd.org). Cite: Saal et al., JOM 65, 1501 (2013); Kirklin et al., npj Comp. Mater. 1, 15010 (2015). (CC-BY-4.0)
  • materials_project — Data from the Materials Project (materialsproject.org). Cite: Jain et al., APL Materials 1, 011002 (2013). (CC-BY-4.0)
  • jarvis — Data from JARVIS (jarvis.nist.gov), NIST. Cite: Choudhary et al., npj Comp. Mater. 6, 173 (2020). (LicenseRef-US-Gov-PD)
  • mpaloe — Data from MP-ALOE. Cite: Kuner et al., npj Comput. Mater. (2025), doi:10.1038/s41524-025-01834-9.

Analyze HfNCl in the Lattice Graph platform

Polymorph comparison, confidence scoring, supply-chain risk, and patent monitoring — across 85 source databases.

Explore the Platform →
Results are informational and should be validated by qualified professionals. See Terms of Service