HfI4

hafnium(IV) iodide · hafnium tetraiodide

Hafnium(IV) iodide is a stable, insulating inorganic halide used primarily as a precursor in the chemical transport and purification of hafnium metal.

HfI
Crystal structure of HfI4 (monoclinic, C2/c (No. 15))
Ground-state structure · Materials Project
Overview

About hafnium(IV) iodide

Hafnium(IV) iodide is a thermodynamically stable halide compound characterized by its insulating electronic nature. It serves as a critical intermediate in the chemical processing of transition metals, leveraging its volatility and reactivity to facilitate high-purity material synthesis. The compound is highly regarded for its role in specialized chemical vapor transport applications. Its structural versatility is highlighted by a significant number of reported configurations across various databases, reflecting its importance in inorganic chemistry research.

At a glance

Key Properties

Cross-validated computational properties for hafnium(IV) iodide, aggregated across 5 databases.

Band Gap

0.70–3.43 eV
Range across DFT structures · ground state: wide gap

Energy Above Hull

0.000 eV/atom
Best (lowest) across sources

Stability

Stable
3 DFT sources

Structures

27
5 databases, 7 space groups
Validation

Cross-Source DFT Agreement

How well independent DFT databases agree on the thermodynamics of HfI4. Tight agreement means computed properties can be trusted without re-running calculations.

Agreement Score

1.00 / 1.00
Trust tier: high

Hull Spread

0.000 eV
EAH spread across sources

Sources Compared

3
jarvis, materials_project, oqmd

Space Group Consensus

All match
Crystallography

Reported Structures

Lowest-energy structures reported for HfI4, ranked by energy above hull.

Space GroupCrystal SystemBand Gap (eV)E above hull (eV/atom)E/atom (eV)Density (g/cm³)
——2.510.0000-1.047—
C2/c (No. 15)monoclinic2.310.0000-4.4275.24
C2/c (No. 15)monoclinic2.050.0000-0.915—
——2.330.0008-1.047—
Pa-3 (No. 205)cubic3.290.0300-4.3974.56
——2.270.0301-1.017—
——3.430.0331-1.014—
——0.700.0615-0.986—
P-1 (No. 2)triclinic———12.68
C2/c (No. 15)monoclinic———4.82
P-1 (No. 2)triclinic———9.83
P-1 (No. 2)triclinic———4.33
Uses

Applications

Where hafnium(IV) iodide is used.

Chemical vapor transportPurification of hafnium metalPrecursor for chemical vapor deposition
Reference

Frequently Asked Questions

Common questions about hafnium(IV) iodide, answered from cross-validated data.

What is HfI4?

Hafnium(IV) iodide is a stable, insulating inorganic halide used primarily as a precursor in the chemical transport and purification of hafnium metal.

More questions
What is HfI4 used for?
hafnium(IV) iodide (HfI4) is used in chemical vapor transport, purification of hafnium metal, and precursor for chemical vapor deposition.
What is the band gap of HfI4?
hafnium(IV) iodide (HfI4) has a DFT-computed band gap of 0.70–3.43 eV across 27 reported structures. Standard DFT underestimates band gaps, so the measured gap is typically larger.
Is HfI4 a metal, semiconductor, or insulator?
DFT predicts a wide band gap of up to 3.43 eV (an insulator or wide-band-gap material).
Is HfI4 thermodynamically stable?
Yes — hafnium(IV) iodide (HfI4) sits on the convex hull (energy above hull 0 eV/atom), i.e. stable.
What is the crystal structure of HfI4?
The reference structure of hafnium(IV) iodide (HfI4) is monoclinic symmetry, space group C2/c (No. 15).
What is the density of HfI4?
The computed density of the ground-state structure of hafnium(IV) iodide (HfI4) is 5.24 g/cm³.
How many polymorphs of HfI4 are known?
27 structures of HfI4 are reported across 5 databases, spanning 7 distinct space groups.
What elements does HfI4 contain?
hafnium(IV) iodide (HfI4) contains Hf and I (2 elements).
Where does the data for HfI4 come from?
HfI4 data is cross-referenced from oqmd, materials_project, jarvis, mpaloe, cod.
Comparison

How It Compares

As a stable binary halide, hafnium(IV) iodide represents a fundamental building block in the study of group four metal halides. It functions as a primary reagent for vapor-phase transport processes, providing a stable pathway for the isolation and refinement of hafnium compared to more complex or less stable halide counterparts.

Data sources & attribution
  • oqmd — Data from the OQMD (oqmd.org). Cite: Saal et al., JOM 65, 1501 (2013); Kirklin et al., npj Comp. Mater. 1, 15010 (2015). (CC-BY-4.0)
  • materials_project — Data from the Materials Project (materialsproject.org). Cite: Jain et al., APL Materials 1, 011002 (2013). (CC-BY-4.0)
  • jarvis — Data from JARVIS (jarvis.nist.gov), NIST. Cite: Choudhary et al., npj Comp. Mater. 6, 173 (2020). (LicenseRef-US-Gov-PD)
  • mpaloe — Data from MP-ALOE. Cite: Kuner et al., npj Comput. Mater. (2025), doi:10.1038/s41524-025-01834-9.
  • cod — Data from the Crystallography Open Database (crystallography.net/cod/). Cite: Grazulis et al., J. Appl. Cryst. 42, 726 (2009). (CC0-1.0)

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