Hf4Tl2
Hf4Tl2 is a thermodynamically stable, metallic intermetallic compound formed from hafnium and thallium.
About Hf4Tl2
Hf4Tl2 is a metallic intermetallic compound composed of hafnium and thallium. As a thermodynamically stable phase located on the convex hull, it represents a robust structural arrangement that persists under standard conditions. Its metallic character suggests high electrical conductivity, making it an interesting candidate for fundamental studies in solid-state physics and metallurgy. The compound is supported by a significant body of structural data, reflecting its prominence in computational databases. Its stability and well-defined composition make it a valuable subject for researchers investigating the interactions between transition metals and post-transition elements. This material serves as a baseline for understanding phase formation in complex binary systems.
Key Properties
Cross-validated computational properties for Hf4Tl2, aggregated across 4 databases.
Band GapEnergy needed to move an electron from the valence band to the conduction band. Lower or zero values tend to behave more metallic; larger gaps are more insulating or semiconducting.
Energy Above HullThermodynamic distance from the most stable set of competing phases. 0 eV/atom is on the convex hull; small positive values may still be experimentally accessible.
StabilityA plain-language summary of the best reported energy-above-hull result. It reflects whether the lowest-energy structure is on, near, or far from the stability hull.
StructuresCount of reported calculated crystal structures for this formula, including alternate polymorphs, source databases, and observed space groups.
Reported Structures
Lowest-energy structures reported for Hf4Tl2, ranked by energy above hull.
| Space GroupSymmetry classification of the crystal arrangement. The number is the international space-group index. | Crystal SystemBroad lattice family, such as cubic, tetragonal, monoclinic, or triclinic, derived from unit-cell symmetry. | Band Gap (eV)Electronic gap calculated for this specific reported structure, measured in electronvolts. | E above hull (eV/atom)Thermodynamic distance from the convex hull for this structure, normalized per atom. Lower is generally more stable. | E/atom (eV)Computed total energy normalized per atom. Use energy above hull, not this value alone, when comparing stability. | Density (g/cm³)Mass per relaxed crystal volume, reported in grams per cubic centimeter. |
|---|---|---|---|---|---|
| I4/mmm (No. 139) | tetragonal | 0.00 | 0.0000 | -47.858 | 14.09 |
| Cmcm (No. 63) | — | — | — | — | — |
| Cmcm (No. 63) | — | — | — | — | — |
| P63/mmc (No. 194) | — | — | — | — | — |
| Cmcm (No. 63) | — | — | — | — | — |
| P-3m1 (No. 164) | — | — | — | — | — |
| C2/m (No. 12) | — | — | — | — | — |
| R32 (No. 155) | — | — | — | — | — |
| P4/mmm (No. 123) | — | — | — | — | — |
| Cmmm (No. 65) | — | — | — | — | — |
| P4/mmm (No. 123) | — | — | — | — | — |
| P-1 (No. 2) | — | — | — | — | — |
Applications
Where Hf4Tl2 is used.
Frequently Asked Questions
Common questions about Hf4Tl2, answered from cross-validated data.
What is Hf4Tl2?
Hf4Tl2 is a thermodynamically stable, metallic intermetallic compound formed from hafnium and thallium.
What is Hf4Tl2 used for?
What is the band gap of Hf4Tl2?
Is Hf4Tl2 a metal, semiconductor, or insulator?
Is Hf4Tl2 thermodynamically stable?
What is the crystal structure of Hf4Tl2?
What is the density of Hf4Tl2?
How many polymorphs of Hf4Tl2 are known?
What elements does Hf4Tl2 contain?
Where does the data for Hf4Tl2 come from?
How It Compares
As a distinct binary intermetallic, Hf4Tl2 occupies a unique position in materials science where its thermodynamic stability distinguishes it from metastable phases that often appear in similar hafnium-based systems. It serves as a primary reference point for studying the bonding behavior between heavy transition metals and thallium, providing a stable structural benchmark for the broader class of hafnium-thallium alloys.
Data sources & attribution
- materials_project — Data from the Materials Project. Cite: Jain et al., APL Materials 1, 011002 (2013).
- aflow — Data from AFLOW. Cite: Curtarolo et al., Comp. Mater. Sci. 58, 218 (2012).
Analyze Hf4Tl2 in the Lattice Graph platform
Polymorph comparison, confidence scoring, supply-chain risk, and patent monitoring — across 53 integrated data sources.
Explore the Platform →