Hf3N2O3

Hf3N2O3 is a thermodynamically stable hafnium oxynitride that functions as a wide-band-gap insulating material.

HfNO
Crystal structure of Hf3N2O3 (monoclinic, Cm (No. 8))
Ground-state structure · Materials Project
Overview

About Hf3N2O3

Hf3N2O3 is a thermodynamically stable compound that exists on the convex hull, indicating robust structural integrity. As a wide-band-gap insulator, it possesses electronic properties that make it an intriguing candidate for specialized dielectric or protective coating applications.

With numerous reported structures documented across multiple databases, this material is a subject of significant interest for researchers investigating hafnium-based oxynitrides. Its stability and insulating nature suggest potential utility in high-performance electronic or optoelectronic environments.

At a glance

Key Properties

Cross-validated computational properties for Hf3N2O3, aggregated across 3 databases.

Band Gap

3.15–3.36 eV
Range across DFT structures · ground state: insulator

Energy Above Hull

0.044 eV/atom
Best (lowest) across sources

Stability

Metastable
2 DFT sources

Structures

17
3 databases, 3 space groups
Validation

Cross-Source DFT Agreement

How well independent DFT databases agree on the thermodynamics of Hf3N2O3. Tight agreement means computed properties can be trusted without re-running calculations.

Agreement Score

0.94 / 1.00
Trust tier: medium

Hull Spread

0.014 eV
EAH spread across sources

Sources Compared

2
jarvis, materials_project

Space Group Consensus

All match
Crystallography

Reported Structures

Lowest-energy structures reported for Hf3N2O3, ranked by energy above hull.

Space GroupCrystal SystemBand Gap (eV)E above hull (eV/atom)E/atom (eV)Density (g/cm³)
Cm (No. 8)monoclinic3.360.0441-2.916—
Cm (No. 8)monoclinic3.150.0579-10.6959.23
Cmcm (No. 63)orthorhombic3.290.0616-10.6919.21
Cm (No. 8)monoclinic3.250.0955-10.6578.98
Cmc21 (No. 36)orthorhombic3.290.1284-10.6258.98
Cm (No. 8)monoclinic———9.54
Cm (No. 8)monoclinic———9.18
Cm (No. 8)monoclinic———9.03
Cm (No. 8)monoclinic———9.22
Cmcm (No. 63)orthorhombic———9.20
Cm (No. 8)monoclinic———8.98
Cmc21 (No. 36)orthorhombic———8.98
Uses

Applications

Where Hf3N2O3 is used.

Dielectric materials researchProtective coatingsOptoelectronic component development
Reference

Frequently Asked Questions

Common questions about Hf3N2O3, answered from cross-validated data.

What is Hf3N2O3?

Hf3N2O3 is a thermodynamically stable hafnium oxynitride that functions as a wide-band-gap insulating material.

More questions
What is Hf3N2O3 used for?
Hf3N2O3 is used in dielectric materials research, protective coatings, and optoelectronic component development.
What is the band gap of Hf3N2O3?
Hf3N2O3 has a DFT-computed band gap of 3.15–3.36 eV across 17 reported structures. Standard DFT underestimates band gaps, so the measured gap is typically larger.
Is Hf3N2O3 a metal, semiconductor, or insulator?
DFT predicts a wide band gap of up to 3.36 eV (an insulator or wide-band-gap material).
Is Hf3N2O3 thermodynamically stable?
Hf3N2O3 has a lowest energy above hull of 0.044 eV/atom (metastable).
What is the crystal structure of Hf3N2O3?
The reference structure of Hf3N2O3 is monoclinic symmetry, space group Cm (No. 8).
How many polymorphs of Hf3N2O3 are known?
17 structures of Hf3N2O3 are reported across 3 databases, spanning 3 distinct space groups.
What elements does Hf3N2O3 contain?
Hf3N2O3 contains Hf, N, and O (3 elements).
Where does the data for Hf3N2O3 come from?
Hf3N2O3 data is cross-referenced from jarvis, materials_project, mpaloe.
Comparison

How It Compares

As a distinct oxynitride, Hf3N2O3 occupies a unique position in materials science where the interplay between nitrogen and oxygen coordination around hafnium centers dictates its insulating behavior. While it does not share its specific stoichiometry with other common binary phases, it serves as a critical reference point for understanding the phase space of complex hafnium-based ceramic systems.

Data sources & attribution
  • jarvis — Data from JARVIS (jarvis.nist.gov), NIST. Cite: Choudhary et al., npj Comp. Mater. 6, 173 (2020). (LicenseRef-US-Gov-PD)
  • materials_project — Data from the Materials Project (materialsproject.org). Cite: Jain et al., APL Materials 1, 011002 (2013). (CC-BY-4.0)
  • mpaloe — Data from MP-ALOE. Cite: Kuner et al., npj Comput. Mater. (2025), doi:10.1038/s41524-025-01834-9.

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