Hf2N2O

Hf2N2O is a stable, semiconducting hafnium oxynitride that is widely documented in structural databases.

HfNO
Crystal structure of Hf2N2O (triclinic, P1 (No. 1))
Ground-state structure · Materials Project
Overview

About Hf2N2O

Hf2N2O is a thermodynamically stable oxynitride compound that sits firmly on the convex hull, indicating robust structural integrity. As a semiconducting material, it represents a unique intersection of hafnium-based chemistry, nitrogen, and oxygen, offering a distinct electronic profile for research and development.

Given its high data richness with nearly one hundred reported structures across major databases, this compound is a significant subject for computational and experimental study. Its stability and semiconducting nature make it a compelling candidate for exploring new functional materials in demanding environments.

At a glance

Key Properties

Cross-validated computational properties for Hf2N2O, aggregated across 6 databases.

Band Gap

0.09–2.51 eV
Range across DFT structures · ground state: wide gap

Energy Above Hull

0.050 eV/atom
Best (lowest) across sources

Stability

Metastable
4 DFT sources

Structures

98
6 databases, 14 space groups
Validation

Cross-Source DFT Agreement

How well independent DFT databases agree on the thermodynamics of Hf2N2O. Tight agreement means computed properties can be trusted without re-running calculations.

Agreement Score

0.70 / 1.00
Trust tier: medium

Hull Spread

0.075 eV
EAH spread across sources

Sources Compared

3
jarvis, materials_project, oqmd

Space Group Consensus

—
Crystallography

Reported Structures

Lowest-energy structures reported for Hf2N2O, ranked by energy above hull.

Space GroupCrystal SystemBand Gap (eV)E above hull (eV/atom)E/atom (eV)Density (g/cm³)
P1 (No. 1)triclinic1.130.0501-2.401—
C2/m (No. 12)monoclinic2.060.0509-2.400—
P1 (No. 1)triclinic2.450.0565-2.394—
——0.850.0601-2.296—
C2 (No. 5)monoclinic2.510.0604-2.390—
Pnma (No. 62)orthorhombic0.150.0767-2.374—
Cm (No. 8)monoclinic2.060.0777-2.373—
P21/m (No. 11)monoclinic1.370.0884-2.362—
P1 (No. 1)triclinic1.990.1253-10.69710.60
P1 (No. 1)triclinic2.090.1260-10.69610.61
P1 (No. 1)triclinic2.160.1263-10.69610.60
P1 (No. 1)triclinic2.100.1264-10.69610.60
Uses

Applications

Where Hf2N2O is used.

Semiconductor researchMaterials science explorationAdvanced ceramic development
Reference

Frequently Asked Questions

Common questions about Hf2N2O, answered from cross-validated data.

What is Hf2N2O?

Hf2N2O is a stable, semiconducting hafnium oxynitride that is widely documented in structural databases.

More questions
What is Hf2N2O used for?
Hf2N2O is used in semiconductor research, materials science exploration, and advanced ceramic development.
What is the band gap of Hf2N2O?
Hf2N2O has a DFT-computed band gap of 0.09–2.51 eV across 98 reported structures. Standard DFT underestimates band gaps, so the measured gap is typically larger.
Is Hf2N2O a metal, semiconductor, or insulator?
DFT predicts a band gap of up to 2.51 eV (a semiconductor). Measured gaps are typically larger.
Is Hf2N2O thermodynamically stable?
Hf2N2O has a lowest energy above hull of 0.050 eV/atom (metastable).
What is the crystal structure of Hf2N2O?
The reference structure of Hf2N2O is triclinic symmetry, space group P1 (No. 1).
How many polymorphs of Hf2N2O are known?
98 structures of Hf2N2O are reported across 6 databases, spanning 14 distinct space groups.
What elements does Hf2N2O contain?
Hf2N2O contains Hf, N, and O (3 elements).
Where does the data for Hf2N2O come from?
Hf2N2O data is cross-referenced from jarvis, oqmd, materials_project.
Comparison

How It Compares

As a specialized oxynitride, Hf2N2O occupies a distinct niche within the broader landscape of hafnium-based compounds. While many similar materials are explored for their dielectric properties, this specific stoichiometry is notable for its thermodynamic stability, distinguishing it as a reliable, well-characterized phase in the study of complex transition metal oxynitrides.

Data sources & attribution
  • jarvis — Data from JARVIS (jarvis.nist.gov), NIST. Cite: Choudhary et al., npj Comp. Mater. 6, 173 (2020). (LicenseRef-US-Gov-PD)
  • oqmd — Data from the OQMD (oqmd.org). Cite: Saal et al., JOM 65, 1501 (2013); Kirklin et al., npj Comp. Mater. 1, 15010 (2015). (CC-BY-4.0)
  • materials_project — Data from the Materials Project (materialsproject.org). Cite: Jain et al., APL Materials 1, 011002 (2013). (CC-BY-4.0)

Analyze Hf2N2O in the Lattice Graph platform

Polymorph comparison, confidence scoring, supply-chain risk, and patent monitoring — across 85 source databases.

Explore the Platform →
Results are informational and should be validated by qualified professionals. See Terms of Service