H4K6N2O14S4
H4K6N2O14S4 is a metastable, wide-band-gap insulating compound that serves as a specialized subject for structural and electronic materials research.
About H4K6N2O14S4
H4K6N2O14S4 is a complex inorganic compound characterized by its insulating electronic nature and wide-band-gap behavior. As a metastable material, it represents a unique structural configuration that offers researchers specific insights into chemical stability and bonding within its atomic framework. Its existence across multiple structural databases highlights its significance in ongoing computational and experimental materials research. By providing a distinct electronic profile, this compound serves as a valuable subject for investigating how insulating materials can be tuned for specialized chemical environments. Its metastable state suggests that while it may require specific conditions for synthesis, it holds potential for applications where transient or highly specific structural properties are required.
Key Properties
Cross-validated computational properties for H4K6N2O14S4, aggregated across 3 databases.
Band GapEnergy needed to move an electron from the valence band to the conduction band. Lower or zero values tend to behave more metallic; larger gaps are more insulating or semiconducting.
Energy Above HullThermodynamic distance from the most stable set of competing phases. 0 eV/atom is on the convex hull; small positive values may still be experimentally accessible.
StabilityA plain-language summary of the best reported energy-above-hull result. It reflects whether the lowest-energy structure is on, near, or far from the stability hull.
StructuresCount of reported calculated crystal structures for this formula, including alternate polymorphs, source databases, and observed space groups.
Reported Structures
Lowest-energy structures reported for H4K6N2O14S4, ranked by energy above hull.
| Space GroupSymmetry classification of the crystal arrangement. The number is the international space-group index. | Crystal SystemBroad lattice family, such as cubic, tetragonal, monoclinic, or triclinic, derived from unit-cell symmetry. | Band Gap (eV)Electronic gap calculated for this specific reported structure, measured in electronvolts. | E above hull (eV/atom)Thermodynamic distance from the convex hull for this structure, normalized per atom. Lower is generally more stable. | E/atom (eV)Computed total energy normalized per atom. Use energy above hull, not this value alone, when comparing stability. | Density (g/cm³)Mass per relaxed crystal volume, reported in grams per cubic centimeter. |
|---|---|---|---|---|---|
| P-1 (No. 2) | triclinic | 4.64 | 0.0857 | -5.875 | 2.36 |
| P-1 (No. 2) | triclinic | 2.25 | 0.8201 | -5.141 | 2.36 |
| — | — | — | — | — | 2.05 |
| P-1 (No. 2) | — | — | — | — | — |
| — | — | — | — | — | 1.96 |
| P-1 (No. 2) | — | — | — | — | — |
Applications
Where H4K6N2O14S4 is used.
Frequently Asked Questions
Common questions about H4K6N2O14S4, answered from cross-validated data.
What is H4K6N2O14S4?
H4K6N2O14S4 is a metastable, wide-band-gap insulating compound that serves as a specialized subject for structural and electronic materials research.
What is H4K6N2O14S4 used for?
What is the band gap of H4K6N2O14S4?
Is H4K6N2O14S4 a metal, semiconductor, or insulator?
Is H4K6N2O14S4 thermodynamically stable?
What is the crystal structure of H4K6N2O14S4?
What is the density of H4K6N2O14S4?
How many polymorphs of H4K6N2O14S4 are known?
What elements does H4K6N2O14S4 contain?
Where does the data for H4K6N2O14S4 come from?
How It Compares
As a unique chemical entity within its structural class, H4K6N2O14S4 stands as an independent subject of study. Without direct structural siblings for immediate comparison, it serves as a foundational reference point for exploring the broader properties of complex, metastable insulating systems.
Data sources & attribution
- materials_project — Data from the Materials Project. Cite: Jain et al., APL Materials 1, 011002 (2013).
- omat24 — Data from OMat24 (Meta FAIR). Cite: Barroso-Luque et al., arXiv 2410.12771 (2024).
- aflow — Data from AFLOW. Cite: Curtarolo et al., Comp. Mater. Sci. 58, 218 (2012).
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