F4K4O12Xe4
F4K4O12Xe4 is a metastable, semiconducting compound containing xenon, oxygen, potassium, and fluorine that is primarily studied for its unique chemical bonding properties.
About F4K4O12Xe4
F4K4O12Xe4 is a complex inorganic compound incorporating xenon, oxygen, potassium, and fluorine. Its electronic structure exhibits semiconducting behavior, positioning it as an intriguing subject for fundamental research into noble gas chemistry and high-oxidation-state stabilization.
Due to its position above the thermodynamic hull, this material is considered metastable, requiring specific synthesis conditions to maintain its structural integrity. It represents a rare example of xenon-based coordination chemistry, contributing to the broader understanding of how noble gases can be integrated into solid-state frameworks.
Key Properties
Cross-validated computational properties for F4K4O12Xe4, aggregated across 3 databases.
Band GapEnergy needed to move an electron from the valence band to the conduction band. Lower or zero values tend to behave more metallic; larger gaps are more insulating or semiconducting.
Energy Above HullThermodynamic distance from the most stable set of competing phases. 0 eV/atom is on the convex hull; small positive values may still be experimentally accessible.
StabilityA plain-language summary of the best reported energy-above-hull result. It reflects whether the lowest-energy structure is on, near, or far from the stability hull.
StructuresCount of reported calculated crystal structures for this formula, including alternate polymorphs, source databases, and observed space groups.
Reported Structures
Lowest-energy structures reported for F4K4O12Xe4, ranked by energy above hull.
| Space GroupSymmetry classification of the crystal arrangement. The number is the international space-group index. | Crystal SystemBroad lattice family, such as cubic, tetragonal, monoclinic, or triclinic, derived from unit-cell symmetry. | Band Gap (eV)Electronic gap calculated for this specific reported structure, measured in electronvolts. | E above hull (eV/atom)Thermodynamic distance from the convex hull for this structure, normalized per atom. Lower is generally more stable. | E/atom (eV)Computed total energy normalized per atom. Use energy above hull, not this value alone, when comparing stability. | Density (g/cm³)Mass per relaxed crystal volume, reported in grams per cubic centimeter. |
|---|---|---|---|---|---|
| Pna21 (No. 33) | orthorhombic | 2.89 | 0.5546 | -3.408 | 3.51 |
| — | — | — | — | — | 3.47 |
| Pna21 (No. 33) | — | — | — | — | — |
Applications
Where F4K4O12Xe4 is used.
Frequently Asked Questions
Common questions about F4K4O12Xe4, answered from cross-validated data.
What is F4K4O12Xe4?
F4K4O12Xe4 is a metastable, semiconducting compound containing xenon, oxygen, potassium, and fluorine that is primarily studied for its unique chemical bonding properties.
What is F4K4O12Xe4 used for?
What is the band gap of F4K4O12Xe4?
Is F4K4O12Xe4 a metal, semiconductor, or insulator?
Is F4K4O12Xe4 thermodynamically stable?
What is the crystal structure of F4K4O12Xe4?
What is the density of F4K4O12Xe4?
How many polymorphs of F4K4O12Xe4 are known?
What elements does F4K4O12Xe4 contain?
Where does the data for F4K4O12Xe4 come from?
How It Compares
As a unique compound within the landscape of xenon-containing inorganic materials, F4K4O12Xe4 serves as a specialized case study for non-traditional bonding environments. Unlike more common, highly stable oxides or fluorides, this material highlights the challenges of achieving structural persistence in complex xenon-based systems.
Data sources & attribution
- materials_project — Data from the Materials Project. Cite: Jain et al., APL Materials 1, 011002 (2013).
- omat24 — Data from OMat24 (Meta FAIR). Cite: Barroso-Luque et al., arXiv 2410.12771 (2024).
- aflow — Data from AFLOW. Cite: Curtarolo et al., Comp. Mater. Sci. 58, 218 (2012).
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