F2

Fluorine gas · Molecular fluorine, Difluorine

Fluorine gas is a highly reactive, insulating diatomic molecule that serves as a potent chemical oxidant in industrial and laboratory synthesis.

F
Crystal structure of F2 (orthorhombic, Cmce (No. 64))
Ground-state structure · Materials Project
Overview

About Fluorine gas

Fluorine gas is the diatomic form of the most electronegative element in the periodic table. As a wide-band-gap insulator, it exists as a pale yellow gas under standard conditions and is characterized by its extreme chemical reactivity, which stems from the relatively weak bond between its atoms.

Its thermodynamic stability on the convex hull underscores its role as a fundamental building block in inorganic chemistry. It is widely utilized in industrial processes that require aggressive fluorinating agents, particularly in the production of specialized materials and high-performance electronics.

At a glance

Key Properties

Cross-validated computational properties for Fluorine gas, aggregated across 5 databases.

Band Gap

0.48–3.09 eV
Range across DFT structures

Energy Above Hull

0.000 eV/atom
Best (lowest) across sources

Stability

On hull (stable)
3 DFT sources

Structures

47
5 databases, 10 space groups
Crystallography

Reported Structures

Lowest-energy structures reported for F2, ranked by energy above hull.

Space GroupCrystal SystemBand Gap (eV)E above hull (eV/atom)E/atom (eV)Density (g/cm³)
Cmce (No. 64)orthorhombic2.900.0000-3.1262.37
C2/c (No. 15)monoclinic2.900.0024-3.1242.36
C2/m (No. 12)monoclinic2.390.0030-3.1232.33
Cmce (No. 64)orthorhombic3.090.0035-3.1231.34
C2/c (No. 15)monoclinic0.000.2772-2.8492.70
C2/c (No. 15)monoclinic0.480.3095-2.8172.41
Pm-3n (No. 223)cubic0.000.7790-2.3473.19
No. 0unknown0.49
P4/mmm (No. 123)
P4/mmm (No. 123)
No. 0unknown0.21
P63/mmc (No. 194)
Uses

Applications

Where Fluorine gas is used.

Production of uranium hexafluoride for nuclear fuelSynthesis of sulfur hexafluoride for electrical insulationManufacturing of fluoropolymers like PTFEEtching processes in semiconductor fabrication
Reference

Frequently Asked Questions

Common questions about Fluorine gas, answered from cross-validated data.

What is F2?

Fluorine gas is a highly reactive, insulating diatomic molecule that serves as a potent chemical oxidant in industrial and laboratory synthesis.

More questions
What is F2 used for?
Fluorine gas (F2) is used in production of uranium hexafluoride for nuclear fuel, synthesis of sulfur hexafluoride for electrical insulation, manufacturing of fluoropolymers like PTFE, and etching processes in semiconductor fabrication.
What is the band gap of F2?
Fluorine gas (F2) has a DFT-computed band gap of 0.48–3.09 eV across 47 reported structures.
Is F2 a metal, semiconductor, or insulator?
With a wide band gap up to 3.09 eV it is an insulator / wide-band-gap material.
Is F2 thermodynamically stable?
Yes — Fluorine gas (F2) sits on the convex hull (energy above hull 0 eV/atom), i.e. on hull (stable).
What is the crystal structure of F2?
The lowest-energy reported polymorph of Fluorine gas (F2) is orthorhombic symmetry, space group Cmce (No. 64).
What is the density of F2?
The computed density of the ground-state structure of Fluorine gas (F2) is 2.37 g/cm³.
How many polymorphs of F2 are known?
47 structures of F2 are reported across 5 databases, spanning 10 distinct space groups.
What elements does F2 contain?
Fluorine gas (F2) contains F (1 element).
Where does the data for F2 come from?
F2 data is cross-referenced from materials_project, cod, aflow.
Comparison

How It Compares

As a fundamental diatomic element, fluorine gas serves as the primary reference point for the reactivity of halogen-based compounds, setting the standard for oxidative strength within its chemical class.

Data sources & attribution
  • materials_project — Data from the Materials Project. Cite: Jain et al., APL Materials 1, 011002 (2013).
  • cod — Data from the Crystallography Open Database. Cite: Grazulis et al., Nucleic Acids Res. 40, D420 (2012).
  • aflow — Data from AFLOW. Cite: Curtarolo et al., Comp. Mater. Sci. 58, 218 (2012).

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