F10I2N4O8
F10I2N4O8 is a metastable, semiconducting inorganic compound composed of fluorine, iodine, nitrogen, and oxygen.
About F10I2N4O8
F10I2N4O8 is a complex, multi-element compound characterized by its semiconducting electronic nature. As a metastable material, it represents a specialized chemical arrangement that exists in a delicate balance, offering researchers unique insights into the bonding interactions between iodine, nitrogen, oxygen, and fluorine.
Its structural diversity is evidenced by multiple reported configurations across various databases. This compound serves as a subject of interest for materials scientists investigating the synthesis and stability of highly fluorinated nitrogen-iodine frameworks, which are often explored for their distinct reactivity profiles.
Key Properties
Cross-validated computational properties for F10I2N4O8, aggregated across 3 databases.
Band GapEnergy needed to move an electron from the valence band to the conduction band. Lower or zero values tend to behave more metallic; larger gaps are more insulating or semiconducting.
Energy Above HullThermodynamic distance from the most stable set of competing phases. 0 eV/atom is on the convex hull; small positive values may still be experimentally accessible.
StabilityA plain-language summary of the best reported energy-above-hull result. It reflects whether the lowest-energy structure is on, near, or far from the stability hull.
StructuresCount of reported calculated crystal structures for this formula, including alternate polymorphs, source databases, and observed space groups.
Reported Structures
Lowest-energy structures reported for F10I2N4O8, ranked by energy above hull.
| Space GroupSymmetry classification of the crystal arrangement. The number is the international space-group index. | Crystal SystemBroad lattice family, such as cubic, tetragonal, monoclinic, or triclinic, derived from unit-cell symmetry. | Band Gap (eV)Electronic gap calculated for this specific reported structure, measured in electronvolts. | E above hull (eV/atom)Thermodynamic distance from the convex hull for this structure, normalized per atom. Lower is generally more stable. | E/atom (eV)Computed total energy normalized per atom. Use energy above hull, not this value alone, when comparing stability. | Density (g/cm³)Mass per relaxed crystal volume, reported in grams per cubic centimeter. |
|---|---|---|---|---|---|
| P-1 (No. 2) | triclinic | 1.47 | 0.0487 | -5.242 | 2.81 |
| P-1 (No. 2) | — | — | — | — | — |
| — | — | — | — | — | 2.76 |
Applications
Where F10I2N4O8 is used.
Frequently Asked Questions
Common questions about F10I2N4O8, answered from cross-validated data.
What is F10I2N4O8?
F10I2N4O8 is a metastable, semiconducting inorganic compound composed of fluorine, iodine, nitrogen, and oxygen.
What is F10I2N4O8 used for?
What is the band gap of F10I2N4O8?
Is F10I2N4O8 a metal, semiconductor, or insulator?
Is F10I2N4O8 thermodynamically stable?
What is the crystal structure of F10I2N4O8?
What is the density of F10I2N4O8?
How many polymorphs of F10I2N4O8 are known?
What elements does F10I2N4O8 contain?
Where does the data for F10I2N4O8 come from?
How It Compares
As a unique chemical entity, F10I2N4O8 occupies a distinct niche in materials science. Without direct structural analogs in its immediate class, it serves as a critical reference point for understanding how high-density halogen and nitrogen bonding influences the electronic properties of metastable inorganic frameworks.
Data sources & attribution
- materials_project — Data from the Materials Project. Cite: Jain et al., APL Materials 1, 011002 (2013).
- aflow — Data from AFLOW. Cite: Curtarolo et al., Comp. Mater. Sci. 58, 218 (2012).
- omat24 — Data from OMat24 (Meta FAIR). Cite: Barroso-Luque et al., arXiv 2410.12771 (2024).
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