Cs8O16Ru4

Cs8O16Ru4 is a stable, semiconducting ruthenate oxide primarily investigated for its potential utility in oxygen-evolution catalysis.

Crystal structure of Cs8O16Ru4 (orthorhombic, Pnma (No. 62))
Ground-state structure · Materials Project
Overview

About Cs8O16Ru4

Cs8O16Ru4 is a complex ruthenate oxide that functions as a semiconducting material. Its position on the thermodynamic convex hull highlights its inherent stability, making it a subject of interest for researchers investigating robust inorganic frameworks for electrochemical processes. As a member of the oxygen-evolution catalyst class, this compound leverages its unique structural arrangement to facilitate charge transfer. Its presence in multiple structural databases underscores its significance as a well-characterized candidate for advanced catalytic studies.

At a glance

Key Properties

Cross-validated computational properties for Cs8O16Ru4, aggregated across 3 databases.

Band Gap

0.59 eV
Range across DFT structures

Energy Above Hull

0.000 eV/atom
Best (lowest) across sources

Stability

On hull (stable)
2 DFT sources

Structures

3
3 databases, 1 space group
Crystallography

Reported Structures

Lowest-energy structures reported for Cs8O16Ru4, ranked by energy above hull.

Space GroupCrystal SystemBand Gap (eV)E above hull (eV/atom)E/atom (eV)Density (g/cm³)
Pnma (No. 62)orthorhombic0.590.0000-6.1394.52
3.78
Pnma (No. 62)
Uses

Applications

Where Cs8O16Ru4 is used.

Oxygen-evolution catalysis researchElectrochemical energy conversion studies
Reference

Frequently Asked Questions

Common questions about Cs8O16Ru4, answered from cross-validated data.

What is Cs8O16Ru4?

Cs8O16Ru4 is a stable, semiconducting ruthenate oxide primarily investigated for its potential utility in oxygen-evolution catalysis.

More questions
What is Cs8O16Ru4 used for?
Cs8O16Ru4 is used in oxygen-evolution catalysis research and electrochemical energy conversion studies.
What is the band gap of Cs8O16Ru4?
Cs8O16Ru4 has a DFT-computed band gap of 0.59 eV across 3 reported structures.
Is Cs8O16Ru4 a metal, semiconductor, or insulator?
With a band gap up to 0.59 eV it is a semiconductor.
Is Cs8O16Ru4 thermodynamically stable?
Yes — Cs8O16Ru4 sits on the convex hull (energy above hull 0 eV/atom), i.e. on hull (stable).
What is the crystal structure of Cs8O16Ru4?
The lowest-energy reported polymorph of Cs8O16Ru4 is orthorhombic symmetry, space group Pnma (No. 62).
What is the density of Cs8O16Ru4?
The computed density of the ground-state structure of Cs8O16Ru4 is 4.52 g/cm³.
How many polymorphs of Cs8O16Ru4 are known?
3 structures of Cs8O16Ru4 are reported across 3 databases, spanning 1 distinct space group.
What elements does Cs8O16Ru4 contain?
Cs8O16Ru4 contains Cs, O, and Ru (3 elements).
Where does the data for Cs8O16Ru4 come from?
Cs8O16Ru4 data is cross-referenced from materials_project, omat24, aflow.
Comparison

How It Compares

Within the oxide oxygen-evolution catalysts class.

Unlike the more common transition metal oxides such as NiO or LiCoO2, which are widely utilized in commercial battery technologies, Cs8O16Ru4 represents a more specialized class of ruthenate-based catalysts. While materials like LaMnO3 or BiFeO3 are frequently studied for their magnetic and multiferroic properties, Cs8O16Ru4 is primarily evaluated for its specific role in oxygen-evolution reactions, offering a distinct electronic profile compared to the standard perovskite-structured members of this group.

Explore

Related Compounds

Other Oxide Oxygen-Evolution Catalysts in the database.

Data sources & attribution
  • materials_project — Data from the Materials Project. Cite: Jain et al., APL Materials 1, 011002 (2013).
  • omat24 — Data from OMat24 (Meta FAIR). Cite: Barroso-Luque et al., arXiv 2410.12771 (2024).
  • aflow — Data from AFLOW. Cite: Curtarolo et al., Comp. Mater. Sci. 58, 218 (2012).

Analyze Cs8O16Ru4 in the Lattice Graph platform

Polymorph comparison, confidence scoring, supply-chain risk, and patent monitoring — across 53 integrated data sources.

Explore the Platform →