Bi4O7

Bi4O7 is a thermodynamically stable bismuth oxide semiconductor used in materials science research.

BiO
Crystal structure of Bi4O7 (triclinic, P-1 (No. 2))
Ground-state structure · Materials Project
Overview

About Bi4O7

Bi4O7 is a distinct bismuth-based oxide that occupies a stable position on the thermodynamic convex hull. As a semiconducting material, it represents a unique stoichiometry within the bismuth-oxygen binary system, characterized by a well-defined structural framework that has been documented across multiple experimental and computational databases. Its stable nature makes it a subject of interest for researchers investigating the electronic and optoelectronic properties of heavy-metal oxides. The material's ability to maintain structural integrity under various conditions suggests potential utility in specialized electronic components where bismuth-rich phases are required. Its electronic character positions it as a candidate for further exploration in semiconductor device physics.

At a glance

Key Properties

Cross-validated computational properties for Bi4O7, aggregated across 5 databases.

Band Gap

0.86–1.05 eV
Range across DFT structures · ground state: narrow gap

Energy Above Hull

0.000 eV/atom
Best (lowest) across sources

Stability

Stable
3 DFT sources

Structures

13
5 databases, 3 space groups
Validation

Cross-Source DFT Agreement

How well independent DFT databases agree on the thermodynamics of Bi4O7. Tight agreement means computed properties can be trusted without re-running calculations.

Agreement Score

1.00 / 1.00
Trust tier: high

Hull Spread

0.000 eV
EAH spread across sources

Sources Compared

3
jarvis, materials_project, oqmd

Space Group Consensus

All match
Crystallography

Reported Structures

Lowest-energy structures reported for Bi4O7, ranked by energy above hull.

Space GroupCrystal SystemBand Gap (eV)E above hull (eV/atom)E/atom (eV)Density (g/cm³)
——1.050.0000-1.399—
P-1 (No. 2)triclinic0.940.0000-6.1329.23
P-1 (No. 2)triclinic0.860.0000-1.264—
——0.000.0961-1.303—
P-43m (No. 215)cubic0.000.1460-1.118—
P-4b2 (No. 117)tetragonal0.000.1591-5.9739.08
P-1 (No. 2)triclinic———8.91
P-1 (No. 2)triclinic———9.54
P-4b2 (No. 117)tetragonal———9.35
P-4b2 (No. 117)tetragonal———9.08
P-1 (No. 2)triclinic———9.20
P-4b2 (No. 117)tetragonal———9.61
Uses

Applications

Where Bi4O7 is used.

Semiconductor researchElectronic component developmentMaterials science studies
Reference

Frequently Asked Questions

Common questions about Bi4O7, answered from cross-validated data.

What is Bi4O7?

Bi4O7 is a thermodynamically stable bismuth oxide semiconductor used in materials science research.

More questions
What is Bi4O7 used for?
Bi4O7 is used in semiconductor research, electronic component development, and materials science studies.
What is the band gap of Bi4O7?
Bi4O7 has a DFT-computed band gap of 0.86–1.05 eV across 13 reported structures. Standard DFT underestimates band gaps, so the measured gap is typically larger.
Is Bi4O7 a metal, semiconductor, or insulator?
DFT predicts a band gap of up to 1.05 eV (a semiconductor). Measured gaps are typically larger.
Is Bi4O7 thermodynamically stable?
Yes — Bi4O7 sits on the convex hull (energy above hull 0 eV/atom), i.e. stable.
What is the crystal structure of Bi4O7?
The reference structure of Bi4O7 is triclinic symmetry, space group P-1 (No. 2).
What is the density of Bi4O7?
The computed density of the ground-state structure of Bi4O7 is 9.23 g/cm³.
How many polymorphs of Bi4O7 are known?
13 structures of Bi4O7 are reported across 5 databases, spanning 3 distinct space groups.
What elements does Bi4O7 contain?
Bi4O7 contains Bi and O (2 elements).
Where does the data for Bi4O7 come from?
Bi4O7 data is cross-referenced from oqmd, materials_project, jarvis, mpaloe, cod.
Comparison

How It Compares

As a specific bismuth oxide phase, Bi4O7 serves as a critical reference point for understanding the complex phase space of the bismuth-oxygen system. Unlike simpler bismuth oxides, this compound provides a unique structural configuration that bridges the gap between lower and higher oxidation states of bismuth, offering a distinct electronic profile for materials design.

Data sources & attribution
  • oqmd — Data from the OQMD (oqmd.org). Cite: Saal et al., JOM 65, 1501 (2013); Kirklin et al., npj Comp. Mater. 1, 15010 (2015). (CC-BY-4.0)
  • materials_project — Data from the Materials Project (materialsproject.org). Cite: Jain et al., APL Materials 1, 011002 (2013). (CC-BY-4.0)
  • jarvis — Data from JARVIS (jarvis.nist.gov), NIST. Cite: Choudhary et al., npj Comp. Mater. 6, 173 (2020). (LicenseRef-US-Gov-PD)
  • mpaloe — Data from MP-ALOE. Cite: Kuner et al., npj Comput. Mater. (2025), doi:10.1038/s41524-025-01834-9.
  • cod — Data from the Crystallography Open Database (crystallography.net/cod/). Cite: Grazulis et al., J. Appl. Cryst. 42, 726 (2009). (CC0-1.0)

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