As4F40H8Tl4
This complex inorganic compound consists of arsenic, fluorine, hydrogen, and thallium. It is primarily utilized in specialized chemical research settings for structural studies and as a precursor in advanced materials synthesis.
Key Properties
Cross-validated computational properties for As4F40H8Tl4, aggregated across 3 databases.
Band GapEnergy needed to move an electron from the valence band to the conduction band. Lower or zero values tend to behave more metallic; larger gaps are more insulating or semiconducting.
Energy Above HullThermodynamic distance from the most stable set of competing phases. 0 eV/atom is on the convex hull; small positive values may still be experimentally accessible.
StabilityA plain-language summary of the best reported energy-above-hull result. It reflects whether the lowest-energy structure is on, near, or far from the stability hull.
StructuresCount of reported calculated crystal structures for this formula, including alternate polymorphs, source databases, and observed space groups.
Reported Structures
Lowest-energy structures reported for As4F40H8Tl4, ranked by energy above hull.
| Space GroupSymmetry classification of the crystal arrangement. The number is the international space-group index. | Crystal SystemBroad lattice family, such as cubic, tetragonal, monoclinic, or triclinic, derived from unit-cell symmetry. | Band Gap (eV)Electronic gap calculated for this specific reported structure, measured in electronvolts. | E above hull (eV/atom)Thermodynamic distance from the convex hull for this structure, normalized per atom. Lower is generally more stable. | E/atom (eV)Computed total energy normalized per atom. Use energy above hull, not this value alone, when comparing stability. | Density (g/cm³)Mass per relaxed crystal volume, reported in grams per cubic centimeter. |
|---|---|---|---|---|---|
| P21/c (No. 14) | monoclinic | 2.06 | 0.0000 | -4.504 | 4.09 |
| P21/c (No. 14) | — | — | — | — | — |
| No. 0 | unknown | — | — | — | 1.12 |
Applications
Where As4F40H8Tl4 is used.
Frequently Asked Questions
Common questions about As4F40H8Tl4, answered from cross-validated data.
What is As4F40H8Tl4?
This complex inorganic compound consists of arsenic, fluorine, hydrogen, and thallium. It is primarily utilized in specialized chemical research settings for structural studies and as a precursor in advanced materials synthesis.
What is As4F40H8Tl4 used for?
What is the band gap of As4F40H8Tl4?
Is As4F40H8Tl4 a metal, semiconductor, or insulator?
Is As4F40H8Tl4 thermodynamically stable?
What is the crystal structure of As4F40H8Tl4?
What is the density of As4F40H8Tl4?
How many polymorphs of As4F40H8Tl4 are known?
What elements does As4F40H8Tl4 contain?
Where does the data for As4F40H8Tl4 come from?
Data sources & attribution
- materials_project — Data from the Materials Project. Cite: Jain et al., APL Materials 1, 011002 (2013).
- aflow — Data from AFLOW. Cite: Curtarolo et al., Comp. Mater. Sci. 58, 218 (2012).
- cod — Data from the Crystallography Open Database. Cite: Grazulis et al., Nucleic Acids Res. 40, D420 (2012).
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