Ar

Argon · noble gas

Argon is a chemically inert, wide-gap insulating noble gas widely used to provide protective atmospheres in industrial and scientific applications.

Ar
Crystal structure of Ar (cubic, Fm-3m (No. 225))
Ground-state structure · Materials Project
Overview

About Argon

Argon is a noble gas characterized by its exceptional chemical inertness and wide-gap insulating electronic structure. As a thermodynamically stable element, it exists as a monatomic gas under standard conditions and remains chemically unreactive due to its complete valence electron shell.

This stability makes it a vital component in modern technology, where it serves as a protective medium to prevent unwanted chemical reactions. Its prevalence in industrial applications stems from its ability to provide an inert environment during high-temperature processing and sensitive manufacturing tasks.

At a glance

Key Properties

Cross-validated computational properties for Argon, aggregated across 6 databases.

Band Gap

6.92–9.11 eV
Range across DFT structures · ground state: insulator

Energy Above Hull

0.000 eV/atom
Best (lowest) across sources

Stability

Stable
4 DFT sources

Structures

33
6 databases, 2 space groups
Validation

Cross-Source DFT Agreement

How well independent DFT databases agree on the thermodynamics of Ar. Tight agreement means computed properties can be trusted without re-running calculations.

Agreement Score

1.00 / 1.00
Trust tier: high

Hull Spread

0.000 eV
EAH spread across sources

Sources Compared

3
jarvis, materials_project, oqmd

Space Group Consensus

All match
Crystallography

Reported Structures

Lowest-energy structures reported for Ar, ranked by energy above hull.

Space GroupCrystal SystemBand Gap (eV)E above hull (eV/atom)E/atom (eV)Density (g/cm³)
——8.940.00000.000—
Fm-3m (No. 225)cubic8.720.00000.000—
P63/mmc (No. 194)hexagonal8.710.00000.001—
Fm-3m (No. 225)cubic8.510.0000-4.8591.72
P63/mmc (No. 194)hexagonal8.510.0034-4.8551.46
——8.820.00820.008—
——9.110.00860.009—
——9.080.00890.009—
——8.870.01120.011—
——8.880.01250.012—
——8.650.01610.016—
——8.810.01730.017—
Uses

Applications

Where Argon is used.

Inert gas shielding for arc weldingIncandescent and fluorescent lightingSemiconductor manufacturingCryogenic researchAnalytical chemistry
Reference

Frequently Asked Questions

Common questions about Argon, answered from cross-validated data.

What is Ar?

Argon is a chemically inert, wide-gap insulating noble gas widely used to provide protective atmospheres in industrial and scientific applications.

More questions
What is Ar used for?
Argon (Ar) is used in inert gas shielding for arc welding, incandescent and fluorescent lighting, semiconductor manufacturing, cryogenic research, and analytical chemistry.
What is the band gap of Ar?
Argon (Ar) has a DFT-computed band gap of 6.92–9.11 eV across 33 reported structures. Standard DFT underestimates band gaps, so the measured gap is typically larger.
Is Ar a metal, semiconductor, or insulator?
DFT predicts a wide band gap of up to 9.11 eV (an insulator or wide-band-gap material).
Is Ar thermodynamically stable?
Yes — Argon (Ar) sits on the convex hull (energy above hull 0 eV/atom), i.e. stable.
What is the crystal structure of Ar?
The reference structure of Argon (Ar) is cubic symmetry, space group Fm-3m (No. 225).
How many polymorphs of Ar are known?
33 structures of Ar are reported across 6 databases, spanning 2 distinct space groups.
What elements does Ar contain?
Argon (Ar) contains Ar (1 element).
Where does the data for Ar come from?
Ar data is cross-referenced from oqmd, jarvis, materials_project, mpaloe, cod.
Comparison

How It Compares

As a noble gas, Argon occupies a unique position in the periodic table, serving as the standard for inertness and stability within its elemental class.

Data sources & attribution
  • oqmd — Data from the OQMD (oqmd.org). Cite: Saal et al., JOM 65, 1501 (2013); Kirklin et al., npj Comp. Mater. 1, 15010 (2015). (CC-BY-4.0)
  • jarvis — Data from JARVIS (jarvis.nist.gov), NIST. Cite: Choudhary et al., npj Comp. Mater. 6, 173 (2020). (LicenseRef-US-Gov-PD)
  • materials_project — Data from the Materials Project (materialsproject.org). Cite: Jain et al., APL Materials 1, 011002 (2013). (CC-BY-4.0)
  • mpaloe — Data from MP-ALOE. Cite: Kuner et al., npj Comput. Mater. (2025), doi:10.1038/s41524-025-01834-9.
  • cod — Data from the Crystallography Open Database (crystallography.net/cod/). Cite: Grazulis et al., J. Appl. Cryst. 42, 726 (2009). (CC0-1.0)

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