Al4As4Cu4O20
Al4As4Cu4O20 is a metastable, semiconducting inorganic compound containing aluminum, arsenic, copper, and oxygen.
About Al4As4Cu4O20
Al4As4Cu4O20 is a complex inorganic compound composed of aluminum, arsenic, copper, and oxygen. As a semiconducting material, it exhibits electronic properties that make it a subject of interest for specialized research into solid-state chemistry and electronic behavior.
Due to its metastable nature, this compound represents a unique phase within its chemical system. It is currently documented through a limited number of structural configurations, highlighting its role as an emerging material that requires further investigation to fully understand its synthesis and stability profiles.
Key Properties
Cross-validated computational properties for Al4As4Cu4O20, aggregated across 3 databases.
Band GapEnergy needed to move an electron from the valence band to the conduction band. Lower or zero values tend to behave more metallic; larger gaps are more insulating or semiconducting.
Energy Above HullThermodynamic distance from the most stable set of competing phases. 0 eV/atom is on the convex hull; small positive values may still be experimentally accessible.
StabilityA plain-language summary of the best reported energy-above-hull result. It reflects whether the lowest-energy structure is on, near, or far from the stability hull.
StructuresCount of reported calculated crystal structures for this formula, including alternate polymorphs, source databases, and observed space groups.
Reported Structures
Lowest-energy structures reported for Al4As4Cu4O20, ranked by energy above hull.
| Space GroupSymmetry classification of the crystal arrangement. The number is the international space-group index. | Crystal SystemBroad lattice family, such as cubic, tetragonal, monoclinic, or triclinic, derived from unit-cell symmetry. | Band Gap (eV)Electronic gap calculated for this specific reported structure, measured in electronvolts. | E above hull (eV/atom)Thermodynamic distance from the convex hull for this structure, normalized per atom. Lower is generally more stable. | E/atom (eV)Computed total energy normalized per atom. Use energy above hull, not this value alone, when comparing stability. | Density (g/cm³)Mass per relaxed crystal volume, reported in grams per cubic centimeter. |
|---|---|---|---|---|---|
| P21/c (No. 14) | monoclinic | 0.45 | 0.0390 | -6.696 | 3.76 |
| No. 0 | unknown | — | — | — | 0.98 |
| P21/c (No. 14) | — | — | — | — | — |
Frequently Asked Questions
Common questions about Al4As4Cu4O20, answered from cross-validated data.
What is Al4As4Cu4O20?
Al4As4Cu4O20 is a metastable, semiconducting inorganic compound containing aluminum, arsenic, copper, and oxygen.
What is the band gap of Al4As4Cu4O20?
Is Al4As4Cu4O20 a metal, semiconductor, or insulator?
Is Al4As4Cu4O20 thermodynamically stable?
What is the crystal structure of Al4As4Cu4O20?
What is the density of Al4As4Cu4O20?
How many polymorphs of Al4As4Cu4O20 are known?
What elements does Al4As4Cu4O20 contain?
Where does the data for Al4As4Cu4O20 come from?
How It Compares
As a unique inorganic phase, Al4As4Cu4O20 occupies a distinct niche in materials research. Without direct structural siblings in its immediate class, it serves as a standalone example of how aluminum, arsenic, copper, and oxygen can arrange into complex, metastable semiconducting frameworks.
Data sources & attribution
- materials_project — Data from the Materials Project. Cite: Jain et al., APL Materials 1, 011002 (2013).
- cod — Data from the Crystallography Open Database. Cite: Grazulis et al., Nucleic Acids Res. 40, D420 (2012).
- aflow — Data from AFLOW. Cite: Curtarolo et al., Comp. Mater. Sci. 58, 218 (2012).
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